SCOPUS 정보 검색 플랫폼

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 3, 1998, Pages 1478-1482

Etch characteristics of GaN using inductively coupled Cl2/Ar and Cl2/BCl3 plasmas

(6) Lee, Y H a Kim, H S a Yeom, G Y a Lee, J W b Yoo, M C b Kim, T I b

a Sungkyunkwan University (South Korea)

b Samsung Advanced Institute of Technology (SAIT) (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE-RESOLVED XPS; ETCH PARAMETERS; ETCH PROCESS; ETCH PROFILE; ETCH PROPERTIES; ETCH RATES; INDUCTIVELY-COUPLED; OPERATION PRESSURE; RADICAL DENSITIES; SURFACE RESIDUES;

ARGON; EMISSION SPECTROSCOPY; GALLIUM ALLOYS; GALLIUM NITRIDE; GRAFTING (CHEMICAL); INDUCTIVELY COUPLED PLASMA; LEAKAGE (FLUID); LIGHT EMISSION; OPTICAL EMISSION SPECTROSCOPY; PHOTORESISTS; SILICON COMPOUNDS; SYNTHESIS (CHEMICAL);

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0001068033 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.581173 Document Type: Article

Times cited : (60)

References (12)

1
- 75149162545
- R. A. Metzger, Compd. Semicond. 26 (1995).
- (1995) Compd. Semicond. , vol.26
- Metzger, R.A.¹

2
- 0031073677
- J. C. Zolper and R. J. Shul, Mater. Res. Bull, xx, 36 (1997).
- (1997) Mater. Res. Bull , vol.20 , pp. 36
- Zolper, J.C.¹ Shul, R.J.²

3
- 0001937091
- S. J. Pearton, C. B. Vartuli, R. J. Shul, and J. C. Zolper, Mater. Sci, Eng., B 31, 1 (1995).
- (1995) Mater. Sci, Eng., B , vol.31 , pp. 1
- Pearton, S.J.¹ Vartuli, C.B.² Shul, R.J.³ Zolper, J.C.⁴

4
- 0029726347
- R. J. Shul, C. I. H. Ashby, D. J. Rieger, A. J. Howard, S. J. Pearton, C. R. Abernathy, C. B. Vartuli, P. A. Barnes, and P. Davis, Mater. Res. Soc. Symp. Proc. 395, 751 (1996).
- (1996) Mater. Res. Soc. Symp. Proc. , vol.395 , pp. 751
- Shul, R.J.¹ Ashby, C.I.H.² Rieger, D.J.³ Howard, A.J.⁴ Pearton, S.J.⁵ Abernathy, C.R.⁶ Vartuli, C.B.⁷ Barnes, P.A.⁸ Davis, P.⁹

5
- 0030188951
- R. J. Shul, G. B. McClellan, S. J. Pearton, C. R. Abernathy, C. Constantine, and C. Barratt, Electron. Lett. 32, 1408 (1996).
- (1996) Electron. Lett. , vol.32 , pp. 1408
- Shul, R.J.¹ McClellan, G.B.² Pearton, S.J.³ Abernathy, C.R.⁴ Constantine, C.⁵ Barratt, C.⁶

6
- 0030721341
- H. S. Kim, Y. J. Lee, Y. H. Lee, G. Y. Yeom, J. W. Lee, M. C. Lee, and T. I. Kim, Mater. Res. Soc. Symp. Proc. 468 367 (1997).
- (1997) Mater. Res. Soc. Symp. Proc. , vol.468 , pp. 367
- Kim, H.S.¹ Lee, Y.J.² Lee, Y.H.³ Yeom, G.Y.⁴ Lee, J.W.⁵ Lee, M.C.⁶ Kim, T.I.⁷

7
- 0002815429
- H. S. Kim, Y. H. Lee, G. Y. Yeom, J. W. Lee, and T. I. Kim, Mater. Sci. Eng. B 50, 82 (1997).
- (1997) Mater. Sci. Eng. B , vol.50 , pp. 82
- Kim, H.S.¹ Lee, Y.H.² Yeom, G.Y.³ Lee, J.W.⁴ Kim, T.I.⁵

8
- 0029765296
- L. Zhang, J. Ramer, J. Brown, K. Zheng, L. F. Lester, and S. D. Hersee, Mater. Res. Soc. Symp. Proc. 395, 763 (1996).
- (1996) Mater. Res. Soc. Symp. Proc. , vol.395 , pp. 763
- Zhang, L.¹ Ramer, J.² Brown, J.³ Zheng, K.⁴ Lester, L.F.⁵ Hersee, S.D.⁶

9
- 0000979408
- S. J. Pearton, J. W. Lee, J. D. MacKenzie, C. R. Abernathy, and R. J. Shul, Appl. Phys. Lett. 67, 2329 (1995).
- (1995) Appl. Phys. Lett. , vol.67 , pp. 2329
- Pearton, S.J.¹ Lee, J.W.² MacKenzie, J.D.³ Abernathy, C.R.⁴ Shul, R.J.⁵

10
- 2442601245
- A. T. Ping, A. C. Schmitz, M. A. Khan, and I. Adesia, J. Electron. Mater. 25, 825 (1996).
- (1996) J. Electron. Mater. , vol.25 , pp. 825
- Ping, A.T.¹ Schmitz, A.C.² Khan, M.A.³ Adesia, I.⁴

11
- 0000131526
- H. P. Gillis, D. A. Choutov, K. P. Martin, M. D. Bremser, and R. F. Davis, J. Electron. Mater. 26, 301 (1997).
- (1997) J. Electron. Mater. , vol.26 , pp. 301
- Gillis, H.P.¹ Choutov, D.A.² Martin, K.P.³ Bremser, M.D.⁴ Davis, R.F.⁵

12
- 0030685951
- R. J. Shul, R. D. Briggs, S. J. Pearton, C. B. Vartuli, C. R. Abernathy, J. W. Lee, C. Constantine, and C. Barratt, Mater. Res. Soc. Symp. Proc. 449, 969 (1997).
- (1997) Mater. Res. Soc. Symp. Proc. , vol.449 , pp. 969
- Shul, R.J.¹ Briggs, R.D.² Pearton, S.J.³ Vartuli, C.B.⁴ Abernathy, C.R.⁵ Lee, J.W.⁶ Constantine, C.⁷ Barratt, C.⁸

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.