Effect of reactive ion etching-generated sidewall roughness on propagation loss of buried-channel silica waveguides

Applied Physics Letters

Volumn 69, Issue 15, 1996, Pages 2178-2180

  Bazylenko, M V ^a   Gross, M ^a   Faith, M ^b  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

^b TELSTRA RESEARCH LABORATORIES   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038600361     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117157     Document Type: Article

References (11)

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