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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 4 B, 1999, Pages 2646-2651

Reactive ion etching of GaN and AlxGa1-xN using Cl2/CH4/Ar plasma

(7) Basak, Durga a Yamashita, Kenji a Sugahara, Tomoya a Fareed, Qhalid a Nakagawa, Daisuke a Nishino, Katsushi a Sakai, Shiro a

a UNIVERSITY OF TOKUSHIMA (Japan)

Author keywords

AlGaN; CH4; Dry etching; GaN; Reactive ion plasma

Indexed keywords

EID: 0343747098 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.38.2646 Document Type: Article

Times cited : (17)

References (14)

1
- 0026819254
- S. Nakamura, T. Mukai, M. Senoh and N. Iwasa: Jpn. J. Appl. Phys. 31 (1992) L139.
- (1992) Jpn. J. Appl. Phys. , vol.31
- Nakamura, S.¹ Mukai, T.² Senoh, M.³ Iwasa, N.⁴

2
- 84883188181
- H. Amano, M. Kilo, K. Hiramatsu and I. Akasaki: Jpn. J. Appl. Phys. 28(1989) L2112.
- (1989) Jpn. J. Appl. Phys. , vol.28
- Amano, H.¹ Kilo, M.² Hiramatsu, K.³ Akasaki, I.⁴

3
- 0028385147
- S. Nakamura, T. Mukai and M. Senoli: Appl. Phys. Lett. 64 (1994) 1687.
- (1994) Appl. Phys. Lett. , vol.64 , pp. 1687
- Nakamura, S.¹ Mukai, T.² Senoli, M.³

4
- 21544457041
- S. C. Binari, L. B. Rowland, W. Kruppa, G. Kelner, K. Doverspike and D. K. Gaskill: Electron. Lett. 30 (1994) 1248.
- (1994) Electron. Lett. , vol.30 , pp. 1248
- Binari, S.C.¹ Rowland, L.B.² Kruppa, W.³ Kelner, G.⁴ Doverspike, K.⁵ Gaskill, D.K.⁶

5
- 36449001822
- G. F. Mclane, L. Casa, S. J. Pearton and C. R. Abernathy: Appl. Phys. Lett. 66 (1995) 3328.
- (1995) Appl. Phys. Lett. , vol.66 , pp. 3328
- Mclane, G.F.¹ Casa, L.² Pearton, S.J.³ Abernathy, C.R.⁴

6
- 21544471008
- I. Adesida, A. T. Ping, C. Youtsey, T. Dow, M. Asif Khan, D. T. Olson and J. N. Kuznia: Appl. Phys. Lett. 65 (1994) 889.
- (1994) Appl. Phys. Lett. , vol.65 , pp. 889
- Adesida, I.¹ Ping, A.T.² Youtsey, C.³ Dow, T.⁴ Asif Khan, M.⁵ Olson, D.T.⁶ Kuznia, J.N.⁷

7
- 36449002852
- R. J. Shul, S. P. Kilcoyne, M. Hagerott-Crawford, J. E. Parmeter, C. B. Vartuli, C. R. Abernathy and S. J. Pearton: Appl. Phys. Lett. 66 (1995) 1761.
- (1995) Appl. Phys. Lett. , vol.66 , pp. 1761
- Shul, R.J.¹ Kilcoyne, S.P.² Hagerott-Crawford, M.³ Parmeter, J.E.⁴ Vartuli, C.B.⁵ Abernathy, C.R.⁶ Pearton, S.J.⁷

8
- 5244262768
- C. B. Vartuli, S. J. Pearton, J. W. Lee, J. Hong, J. D. Mackenzie, C. R. Abernathy and R. J. Shul: J. Appl. Phys. 69 (1996) 1426.
- (1996) J. Appl. Phys. , vol.69 , pp. 1426
- Vartuli, C.B.¹ Pearton, S.J.² Lee, J.W.³ Hong, J.⁴ Mackenzie, J.D.⁵ Abernathy, C.R.⁶ Shul, R.J.⁷

9
- 0028368821
- M. E. Lin, Z. F. Fan, Z. Ma, L. H. Allen and H. Morkoç: Appl. Phys. Lett. 64 (1994) 887.
- (1994) Appl. Phys. Lett. , vol.64 , pp. 887
- Lin, M.E.¹ Fan, Z.F.² Ma, Z.³ Allen, L.H.⁴ Morkoç, H.⁵

10
- 0030685951
- R. J. Shul, R. D. Briggs, S. J. Pearton, C. B. Vartuli, C. R. Abernathy, J. W. Lee, C. Constantine and C. Barratt: Mater. Res. Soc. Symp. Proc. 449 (1996) 969.
- (1996) Mater. Res. Soc. Symp. Proc. , vol.449 , pp. 969
- Shul, R.J.¹ Briggs, R.D.² Pearton, S.J.³ Vartuli, C.B.⁴ Abernathy, C.R.⁵ Lee, J.W.⁶ Constantine, C.⁷ Barratt, C.⁸

11
- 0029765294
- C. R. Eddy, Jr. and B. Molnar: Mater. Res. Soc. Symp. Proc. 449 (1996) 745.
- (1996) Mater. Res. Soc. Symp. Proc. , vol.449 , pp. 745
- Eddy Jr., C.R.¹ Molnar, B.²

12
- 0347343073
- D. C. Flanders, L. D. Pressman and G. Pinelli: J. Vac. Sci. Technol. B 8 (1990) 1990.
- (1990) J. Vac. Sci. Technol. B , vol.8 , pp. 1990
- Flanders, D.C.¹ Pressman, L.D.² Pinelli, G.³

13
- 0000731993
- S. J. Pearton, C. R. Abernathy, F. Ren and J. R. Lothian: J. Appl. Phys. 76 (1994) 1210.
- (1994) J. Appl. Phys. , vol.76 , pp. 1210
- Pearton, S.J.¹ Abernathy, C.R.² Ren, F.³ Lothian, J.R.⁴

14
- 21544481790
- S. J. Pearton, C. R. Abernathy and F. Ren: Appl. Phys. Lett. 64 (1994) 2294.
- (1994) Appl. Phys. Lett. , vol.64 , pp. 2294
- Pearton, S.J.¹ Abernathy, C.R.² Ren, F.³

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