Cl2/Ar and CH4/H2/Ar dry etching of III-V nitrides

Journal of Applied Physics

Volumn 80, Issue 7, 1996, Pages 3705-3709

  Vartuli, C B ^a   MacKenzie, J D ^a   Lee, J W ^a   Abernathy, C R ^a   Pearton, S J ^a   Shul, R J ^b  

^a University of Florida   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000154634     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363320     Document Type: Article

References (16)

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