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Applied Surface Science

Volumn 161, Issue 1, 2000, Pages 115-122

Interfacial silicon oxide formation during synthesis of ZrO2 on Si(100)

(6) Sun, Y M a Lozano, J a Ho, H a Park, H J a Veldman, S a White, J M a

a The University of Texas at Austin (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; INTERFACES (MATERIALS); OXIDATION; PLASMA SOURCES; REDUCTION; SILICA; SPUTTER DEPOSITION; SYNTHESIS (CHEMICAL); THICKNESS MEASUREMENT; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA SPUTTERING; SILICON OXIDE; ZIRCONIUM SILICIDE;

ZIRCONIA;

EID: 0034227861 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(00)00141-0 Document Type: Article

Times cited : (81)

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