Thermal stability of stacked high-k dielectrics on silicon

Applied Physics Letters

Volumn 79, Issue 23, 2001, Pages 3824-3826

  Chang, J P ^a   Lin, Y S ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035803330     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1419030     Document Type: Article

References (18)

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