Reaction steps of silicidation in ZrO2/SiO2/Si layered structure

Applied Physics Letters

Volumn 80, Issue 24, 2002, Pages 4516-4518

  Muraoka, Kouichi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT POSITION; LAYERED STRUCTURES; POLYCRYSTALLINE-SI; REACTION MODEL; REACTION STEPS; SILICIDATION; ULTRAHIGH VACUUM ANNEALING;

DESORPTION; SILICON; ZIRCONIUM ALLOYS;

SILICON COMPOUNDS;

EID: 79955989385     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1486046     Document Type: Article

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