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Applied Physics A: Materials Science and Processing

Volumn 77, Issue 3-4, 2003, Pages 571-579

SrBi2Ta2O9 ferroelectric thin film capacitors: degradation in a hydrogen ambient

(10) Hartner, W a Bosk, P b Schindler, G b Bacchofer, H b Mort M b Wendt, H b Mikolajick, T b Dehm, C b Schroeder, H c Waser, R c

a INFINEON TECHNOLOGIES (United States)

b INFINEON TECHNOLOGIES AG (Germany)

c FORSCHUNGSZENTRUM JÜLICH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; DEGRADATION; FERROELECTRIC THIN FILMS; HYDROGEN; MECHANICAL VARIABLES MEASUREMENT; NITROGEN; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; STRONTIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

FERROELECTRIC THIN FILM CAPACITORS; FORMING GAS; PLATINUM ELECTRODE;

CAPACITORS;

EID: 0042157192 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-002-1500-y Document Type: Article

Times cited : (23)

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