Review of SrBi2Ta2O9 thin films capacitor processing

Integrated Ferroelectrics

Volumn 26, Issue 1, 1999, Pages 197-213

  Dehm, Christine ^a   Hartner, Walter ^a   Schindler, Günther ^a   Bergmann, Renate ^a   Hasler, Barbara ^a   Kasko, Igor ^a   Kastner, Marcus ^a   Schiele, Manuela ^a   Weinrich, Volker ^a   Mazuré, Carlos ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CAPACITORS; ELECTRIC PROPERTIES; ELECTRODES; METALLIZING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; STRONTIUM COMPOUNDS; TUNGSTEN;

FERROELECTRIC RANDOM ACCESS MEMORIES; LOW POWER BEHAVIOR;

THIN FILMS;

EID: 0033333475     PISSN: 10584587     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1080/10584589908215622     Document Type: Article

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