Recovery of the ferroelectric properties of hydrogen-damaged Ir/Pb(Zr,Ti)O3/Ir capacitors by post annealing

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 5 A, 1998, Pages 2565-2566

  Sakoda, Tomoyuki ^a   Aoki, Katsuhiro ^a   Fukuda, Yukio ^a  

^a Texas Instruments Japan Ltd   (Japan)

Author keywords

Hydrogen damaged capacitor; Ir electrode; Pb(Zr, Ti)O3; Post annealing; Rapid thermal process; Sputter deposition

Indexed keywords

ANNEALING; CAPACITORS; LEAD COMPOUNDS; SPUTTER DEPOSITION; THIN FILMS;

RAPID THERMAL PROCESS;

FERROELECTRIC MATERIALS;

EID: 0032063771     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.2565     Document Type: Article

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