Effects of H2 sintering and Pt upper electrode on metallic Bi content in Sr0.9Bi2.1Ta2O9 thin films for ferroelectric memories prepared by sol-gel method

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 9 PART B, 1998, Pages 5192-5197

  Koiwa, Ichiro ^a   Kanehara, Takao ^a   Kato, Hiroyo ^a   Ono, Sachiko ^b   Sakakibara, Akira ^b   Osaka, Tetsuya ^b   Asami, Katsuhiko ^c  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

^b WASEDA UNIVERSITY   (Japan)

^c TOHOKU UNIVERSITY   (Japan)

Author keywords

H2 sintering effect; Metallic Bi content; Pt upper electrode formation effect; Sol gel method and ferroelectric memories; Sr0.9Bi2.1Ta2O9 thin film; X ray photoelectron spectrometry (XPS)

Indexed keywords

BISMUTH; ELECTRODES; LEAKAGE CURRENTS; NONVOLATILE STORAGE; PLATINUM; SINTERING; SOL-GELS; STRONTIUM COMPOUNDS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

FERROELECTRIC MEMORY; FERROELECTRIC THIN FILMS; HYDROGEN SINTERING; PLATINUM UPPER ELECTRODE;

DIELECTRIC FILMS;

EID: 0032154737     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.5192     Document Type: Article

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