Degradation behavior in the remnant polarization of SrBi2Ta2O9 thin films by hydrogen annealing and its recovery by postannealing

Applied Physics Letters

Volumn 75, Issue 4, 1999, Pages 558-560

  Kwon, Oh Seong ^a   Hwang, Cheol Seong ^a   Hong, Suk Kyoung ^b  

^a Seoul National University   (South Korea)

^b Semiconduct Adv Res Div H   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLIZATION; DEGRADATION; ELECTRODES; ELECTROMAGNETIC WAVE POLARIZATION; FERROELECTRIC MATERIALS; HYDROGEN; PERMITTIVITY; SOL-GELS; STRONTIUM COMPOUNDS; SUBSTRATES; THIN FILMS;

INTERMETALLIC DIELECTRIC (IMD) LAYERS; POSTANNEALING; REMNANT POLARIZATIONS;

DIELECTRIC FILMS;

EID: 0032615123     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124421     Document Type: Article

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