Study of Pt bottom electrodes using high-temperature sputtering for ferroelectric memories with SrBi2Ta2O9 (SBTO) film

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 7, 1998, Pages 4144-4148

  Nasu, Toni ^a   Kibe, Masaki ^a   Uemoto, Yasuhiro ^a   Fujii, Eiji ^a   Otsuki, Tatsuo ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

Columnar grains, adhesion; Ferroelectric thin film; High temperature sputtering; Pt bottom electrode; SrBi2Ta2O9; Ti diffusion

Indexed keywords

ADHESION; CAPACITORS; ELECTRODES; FERROELECTRIC MATERIALS; PLATINUM; SPUTTERING; TEMPERATURE; THIN FILMS;

COLUMNAR GRAINS;

STRONTIUM COMPOUNDS;

EID: 0032119687     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.4144     Document Type: Article

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