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Volumn 19, Issue 12, 2000, Pages 1544-1560

Perspectives on technology and technology-driven CAD

Author keywords

CMOS scaling; Concurrent design; Design; Design for manufacturing; Manufacturing; Simulation; TCAD; Yield

Indexed keywords

CMOS INTEGRATED CIRCUITS; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; CONCURRENT ENGINEERING; INTEGRATED CIRCUIT MANUFACTURE;

EID: 0034428062     PISSN: 02780070     EISSN: None     Source Type: Journal    
DOI: 10.1109/43.898831     Document Type: Article
Times cited : (36)

References (66)
  • 8
    • 84941440119 scopus 로고    scopus 로고
    • A general simulator for VLSI lithography and etching processes: Part II-Application to deposition and etching,"
    • 1980.
    • "A general simulator for VLSI lithography and etching processes: Part II-Application to deposition and etching," IEEE J. Solid-State Circuits, vol. SC-15, p. 1455, 1980.
    • IEEE J. Solid-State Circuits, Vol. SC-15, P. 1455
  • 64
    • 33747490263 scopus 로고    scopus 로고
    • National Computational Science Alliance [Online] . Available: http://Alliance.ncsa.uiuc.edu
    • National Computational Science Alliance [Online] . Available: http://Alliance.ncsa.uiuc.edu
  • 65
    • 33747477030 scopus 로고    scopus 로고
    • Distributed Center for Advanced Electronics Simulations [Online] . Available: http://www.ceg.uiuc.edu/descartes.htm
    • Distributed Center for Advanced Electronics Simulations [Online] . Available: http://www.ceg.uiuc.edu/descartes.htm


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.