Comparison of two-dimensional and three-dimensional models for profile simulation of poly-Si etching of finite length trenches

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 6, 1998, Pages 3274-3280

  Hoekstra, Robert J ^a   Kushner, Mark J ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032354863     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581533     Document Type: Review

References (14)

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