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Volumn 47, Issue 3 PART 1, 2000, Pages 659-666

IsotHermal and Isochronal Annealing Experiments on Irradiated Commercial Power VDMOSFETs

Author keywords

[No Author keywords available]

Indexed keywords

CONSTANT GATE BIAS; ISOCHRONAL ANNEALING; ISOTHERMAL ANNEALING; POST IRRADIATION EFFECT; SWITCHING GATE BIAS; VDMOSFET;

EID: 0034206583     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/23.856495     Document Type: Article
Times cited : (7)

References (32)
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  • 10
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    • Jaksic, A.1    Igic, P.2
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    • Creation and passivation of interface traps in irradiated MOS transistors during annealing at different temperatures
    • M.Pejovic and G.RisticCreation and passivation of interface traps in irradiated MOS transistors during annealing at different temperatures Solid-St. Electron., vol. 41, pp. 715-720, 1997.
    • Solid-St. Electron., Vol. 41, Pp. 715-720, 1997.
    • Pejovic1    Ristic2
  • 21
    • 33747360939 scopus 로고    scopus 로고
    • O.S. Ristic, Ph.D. Thesis, University of Nis, 1998.
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  • 27
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    • Prediction of low dose-rate effects in power MOSFETs based on isochronal annealing measurements
    • L. Dusseau et al., Prediction of low dose-rate effects in power MOSFETs based on isochronal annealing measurements J. Appl. Phys., vol. 81, pp. 2437-2441, 1997.
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    • Dusseau, L.1
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    • Experimental determination of the frequency factor of thermal annealing processes in MOS gate oxide structures
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    • Saigne, F.1
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    • Experimental validation of an accelerated method of oxide trap level characterization for predicting long term thermal effects in MOS devices
    • F. Saigne et al,Experimental validation of an accelerated method of oxide trap level characterization for predicting long term thermal effects in MOS devices IEEE Trans. Nucl Sei., vol, 44, pp. 2001-2006, 1997.
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    • Saigne, F.1
  • 32
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    • Analysis of post-irradiation annealing of n-channel power vertical double-diffused metal-oxide-semiconcluctor transistors to appear in
    • O.S. Ristic, M.M. Pejovic, and A.B. JaksicAnalysis of post-irradiation annealing of n-channel power vertical double-diffused metal-oxide-semiconcluctor transistors to appear in J. Appl. Phys, April 2000.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.