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Volumn 32, Issue 23, 1996, Pages 2183-2184

Use of charge pumping for characterising interface traps during thermal annealing of irradiated power VDMOSFETs

Author keywords

MOSFET; Power semiconductor devices

Indexed keywords

ANNEALING; ENERGY GAP; INTERFACES (MATERIALS); ION BOMBARDMENT; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS;

EID: 0030574147     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19961458     Document Type: Article
Times cited : (12)

References (8)
  • 1
    • 0021201529 scopus 로고
    • A reliable approach to charge-pumping measurements in MOS transistors
    • GROESENEKEN, G., MAES, H.E., BELTRAN, N., and DE KEERSMAECKER, R.F.: 'A reliable approach to charge-pumping measurements in MOS transistors', IEEE Trans., 1984, ED-31, (1), pp. 42-53
    • (1984) IEEE Trans. , vol.ED-31 , Issue.1 , pp. 42-53
    • Groeseneken, G.1    Maes, H.E.2    Beltran, N.3    De Keersmaecker, R.F.4
  • 3
    • 0030171990 scopus 로고    scopus 로고
    • The use of charge-pumping for characterizing irradiated power VDMOSFETs
    • PREVOST, G., AUGIER, P., and PALAU, J.M.: 'The use of charge-pumping for characterizing irradiated power VDMOSFETs', IEEE Trans. Nucl. Sci., 1996, 43, (3), pp. 858-864
    • (1996) IEEE Trans. Nucl. Sci. , vol.43 , Issue.3 , pp. 858-864
    • Prevost, G.1    Augier, P.2    Palau, J.M.3
  • 4
    • 0022600166 scopus 로고
    • Simple technique for separating the effects of interface traps and trapped-oxide charge in metal-oxide-semiconductor transistors
    • MCWHORTER, P.J., and WINOKUR, P.S.: 'Simple technique for separating the effects of interface traps and trapped-oxide charge in metal-oxide-semiconductor transistors', Appl. Phys. Lett., 1986, 48, (2), pp. 133-135
    • (1986) Appl. Phys. Lett. , vol.48 , Issue.2 , pp. 133-135
    • Mcwhorter, P.J.1    Winokur, P.S.2
  • 5
    • 0029637886 scopus 로고
    • Rebound effect in power VDMOSFETs due to latent interface trap generation
    • JAKŠIĆ, A., RISTIĆ, G., and PEJOVIĆ, M.: 'Rebound effect in power VDMOSFETs due to latent interface trap generation', Electron. Lett., 1995, 31, (14), pp. 1198-1199
    • (1995) Electron. Lett. , vol.31 , Issue.14 , pp. 1198-1199
    • Jakšić, A.1    Ristić, G.2    Pejović, M.3
  • 6
    • 0016927294 scopus 로고
    • The use of charge pumping currents to measure surface state densities in MOS transistors
    • ELLIOT, B.M.: 'The use of charge pumping currents to measure surface state densities in MOS transistors', Solid-State Electron., 1976, 19, (3), pp. 241-247
    • (1976) Solid-State Electron. , vol.19 , Issue.3 , pp. 241-247
    • Elliot, B.M.1
  • 7
    • 0024705114 scopus 로고
    • Analysis of the charge pumping technique and its application for the evaluation of MOSFET degradation
    • HEREMANS, P., WITTERS, J., GROESENEKEN, G., and MAES, H.E.: 'Analysis of the charge pumping technique and its application for the evaluation of MOSFET degradation', IEEE Trans. Electron. Devices, 1989, 36, (7), pp. 1318-1335
    • (1989) IEEE Trans. Electron. Devices , vol.36 , Issue.7 , pp. 1318-1335
    • Heremans, P.1    Witters, J.2    Groeseneken, G.3    Maes, H.E.4
  • 8
    • 0027807509 scopus 로고
    • A critical comparison of charge-pumping, dual-transistor, and midgap measurement techniques
    • SCHWANK, J.R., FLEETWOOD, D.M., SHANEYFELT, M.R., and WINOKUR, P.S.: 'A critical comparison of charge-pumping, dual-transistor, and midgap measurement techniques', IEEE Trans. Nucl. Sci., 1993, 40, (6), pt. 1, pp. 1666-1677
    • (1993) IEEE Trans. Nucl. Sci. , vol.40 , Issue.6 PART 1 , pp. 1666-1677
    • Schwank, J.R.1    Fleetwood, D.M.2    Shaneyfelt, M.R.3    Winokur, P.S.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.