메뉴 건너뛰기




Volumn 41, Issue 6, 1994, Pages 1902-1906

Investigation of Possible Sources of 1/f Noise in Irradiated n-Channel Power MOSFETs

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CHARGE CARRIERS; COMPUTATIONAL METHODS; ELECTRIC VARIABLES MEASUREMENT; ELECTRON TUNNELING; INTERFACES (MATERIALS); MATHEMATICAL MODELS; RADIATION EFFECTS; SEMICONDUCTOR JUNCTIONS; SPURIOUS SIGNAL NOISE;

EID: 0028697025     PISSN: 00189499     EISSN: 15581578     Source Type: Journal    
DOI: 10.1109/23.340524     Document Type: Article
Times cited : (10)

References (21)
  • 1
    • 0026853994 scopus 로고
    • Border Traps' in MOS Devices
    • D. M. Fleetwood, “Border Traps’ in MOS Devices,” IEEE Trans. Nucl. Sci., vol. 39, pp. 269–271, 1992.
    • (1992) IEEE Trans. Nucl. Sci , vol.39 , pp. 269-271
    • Fleetwood, D.M.1
  • 3
    • 0027797897 scopus 로고
    • The Role of Border Traps in MOS High-Temperature Postirradiation Annealing Response
    • D. M. Fleetwood, M. R. Shaneyfelt, L. C. Riewe, P. S. Winokur, and R. A. Reber, Jr., “The Role of Border Traps in MOS High-Temperature Postirradiation Annealing Response,” IEEE Trans. Nucl. Sci., vol. 40, pp. 1323–1334, 1993.
    • (1993) IEEE Trans. Nucl. Sci , vol.40 , pp. 1323-1334
    • Fleetwood, D.M.1    Shaneyfelt, M.R.2    Riewe, L.C.3    Winokur, P.S.4    Reber, R.A.5
  • 4
    • 0027585828 scopus 로고
    • 1/f Noise and Interface Trap Density in High Field Stressed pMOS Transistors
    • J. L. Todsen, P. Augier, R. D. Schrimpf, and K. F. Galloway, “1/f Noise and Interface Trap Density in High Field Stressed pMOS Transistors,” Elec. Lett., vol. 29, pp. 696–697, 1993.
    • (1993) Elec. Lett , vol.29 , pp. 696-697
    • Todsen, J.L.1    Augier, P.2    Schrimpf, R.D.3    Galloway, K.F.4
  • 5
    • 0001276890 scopus 로고
    • Effect of Radiation-Induced Interface Traps on 1/f Noise in MOSFETs
    • M. H. Tsai and T. P. Ma, “Effect of Radiation-Induced Interface Traps on 1/f Noise in MOSFETs,” IEEE Trans. Nucl. Sci., vol. 39, pp. 2178–2185, 1992.
    • (1992) IEEE Trans. Nucl. Sci , vol.39 , pp. 2178-2185
    • Tsai, M.H.1    Ma, T.P.2
  • 6
    • 0015142053 scopus 로고
    • Characterization of Low 1/f Noise in MOS Transistors
    • F. M. Klaassen, “Characterization of Low 1/f Noise in MOS Transistors,” IEEE Trans. Elec. Dev., vol. 18, pp. 887–891, 1974.
    • (1974) IEEE Trans. Elec. Dev , vol.18 , pp. 887-891
    • Klaassen, F.M.1
  • 7
    • 0026376339 scopus 로고
    • 1/f Noise in n and p-Channel MOS Devices Through Irradiation and Annealing
    • T. L. Meisenheimer, D. M. Fleetwood, M. R. Shaneyfelt, and L. C. Riewe, “1/f Noise in n and p-Channel MOS Devices Through Irradiation and Annealing,” IEEE Trans. Nucl. Sci., vol. 38, pp. 1297–1303, 1991.
    • (1991) IEEE Trans. Nucl. Sci , vol.38 , pp. 1297-1303
    • Meisenheimer, T.L.1    Fleetwood, D.M.2    Shaneyfelt, M.R.3    Riewe, L.C.4
  • 8
    • 0025631160 scopus 로고
    • Effect of Radiation-Induced Charge on 1/f Noise in MOS Devices
    • T. L. Meisenheimer, D. M. Fleetwood, “Effect of Radiation-Induced Charge on 1/f Noise in MOS Devices,” IEEE Trans. Nucl. Sci., vol. 37, pp. 1696–1702, 1990.
    • (1990) IEEE Trans. Nucl. Sci , vol.37 , pp. 1696-1702
    • Meisenheimer, T.L.1    Fleetwood, D.M.2
  • 9
    • 49949124297 scopus 로고
    • Low Frequency Noise in MOS Transistors
    • S. Christensson, I. Lundstrom, and C. Svensson, “Low Frequency Noise in MOS Transistors,” Solid-St. Elec., vol. 11, pp. 797–812, 1968.
    • (1968) Solid-St. Elec , vol.11 , pp. 797-812
    • Christensson, S.1    Lundstrom, I.2    Svensson, C.3
  • 10
    • 0038089452 scopus 로고
    • Comparison of 1/f Noise in Irradiated Power MOSFETs Measured in the Linear and Saturation Regions
    • P. Augier, J. L. Todsen, D. Zupac, R. D. Schrimpf, K. F. Galloway, and J. A. Babcock, “Comparison of 1/f Noise in Irradiated Power MOSFETs Measured in the Linear and Saturation Regions,” IEEE Trans. NucL Sci., vol. 39, pp. 2012–2017, 1992.
    • (1992) IEEE Trans. NucL Sci , vol.39 , pp. 2012-2017
    • Augier, P.1    Todsen, J.L.2    Zupac, D.3    Schrimpf, R.D.4    Galloway, K.F.5    Babcock, J.A.6
  • 11
    • 0002868708 scopus 로고
    • 1/f Noise and Germanium Surface Properties
    • Philadelphia: University Press
    • A.L. McWhorter, “1/f Noise and Germanium Surface Properties,” in Semiconductor Surface Physics, Philadelphia: University Press, p. 207, 1957.
    • (1957) Semiconductor Surface Physics , pp. 207
    • McWhorter, A.L.1
  • 12
    • 0024732795 scopus 로고
    • A 1/f Noise Technique to Extract the Oxide Trap Density Near the Conduction Band Edge of Silicon
    • R. Jayaraman and C. G. Sodini, “A 1/f Noise Technique to Extract the Oxide Trap Density Near the Conduction Band Edge of Silicon” IEEE Trans. Nucl. Sc., vol. 36, pp. 773–1782, 1989.
    • (1989) IEEE Trans. Nucl. Sc , vol.36 , pp. 773-1782
    • Jayaraman, R.1    Sodini, C.G.2
  • 13
    • 0000299051 scopus 로고
    • Theory and Experiment on the 1/f Noise in p-Channel Metal-Oxide-Semiconductor Field-Effect Transistors at low Drain Bias
    • C. Surya and T. Y. Hsiang, “Theory and Experiment on the 1/f Noise in p-Channel Metal-Oxide-Semiconductor Field-Effect Transistors at low Drain Bias,” Physical Review B, vol 33, pp. 4898–4905, 1986.
    • (1986) Physical Review B , vol.33 , pp. 4898-4905
    • Surya, C.1    Hsiang, T.Y.2
  • 14
    • 0022600166 scopus 로고
    • Simple Technique for Separating the Effects of Interface Traps and Trapped-Oxide Charge in Metal-Oxide-Semiconductor Transistors
    • P. J. McWhorter and P. S. Winokur, “Simple Technique for Separating the Effects of Interface Traps and Trapped-Oxide Charge in Metal-Oxide-Semiconductor Transistors,” Appl. Phys. Lett., vol. 48, pp. 133–135, 1986.
    • (1986) Appl. Phys. Lett , vol.48 , pp. 133-135
    • McWhorter, P.J.1    Winokur, P.S.2
  • 15
    • 0000447713 scopus 로고
    • Simple Method to Estimate Oxide-Trap, Interface-Trap, Trap, and Border-Trap Charge Densities in Metal-Oxide-Semiconductor Transistors
    • D. M. Fleetwood, M. R. Shaneyfelt, and J. R. Schwank, “Simple Method to Estimate Oxide-Trap, Interface-Trap, Trap, and Border-Trap Charge Densities in Metal-Oxide-Semiconductor Transistors,” Appl. Phys. Lett.,vol. 64, pp. 1965–1968, 1994.
    • (1994) Appl. Phys. Lett , vol.64 , pp. 1965-1968
    • Fleetwood, D.M.1    Shaneyfelt, M.R.2    Schwank, J.R.3
  • 17
    • 0020246677 scopus 로고
    • Radiation-Induced Defects in SiO2 as Determined with XPS
    • F. J. Grunthaner, P. J. Grunthaner, and J. Maserjian, “Radiation-Induced Defects in Si O2 as Determined with XPS,” IEEE Trans. Nucl. Sc., vol. 29, pp. 1462–1466, 1982.
    • (1982) IEEE Trans. Nucl. Sc , vol.29 , pp. 1462-1466
    • Grunthaner, F.J.1    Grunthaner, P.J.2    Maserjian, J.3
  • 19
  • 20
    • 0005123159 scopus 로고
    • Radiation-Induced Charge Neutralization and Interface-Trap Buildup in Metal-Oxide-Semiconductor Semiconductor Devices
    • D. M. Fleetwood, “Radiation-Induced Charge Neutralization and Interface-Trap Buildup in Metal-Oxide-Semiconductor Semiconductor Devices,” J. Appl. Phys., vol. 67, pp. 580–583, 1990.
    • (1990) J. Appl. Phys , vol.67 , pp. 580-583
    • Fleetwood, D.M.1
  • 21


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.