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Volumn 82, Issue 8, 1997, Pages 4102-4107
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Experimental determination of the frequency factor of thermal annealing processes in metal-oxide-semiconductor gate-oxide structures
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0006472631
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.365721 Document Type: Article |
Times cited : (22)
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References (15)
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