The mask error factor in optical lithography

IEEE Transactions on Semiconductor Manufacturing

Volumn 13, Issue 2, 2000, Pages 235-242

  Wong, Alfred K ^a,b   Ferguson, Richard A ^a,b   Mansfield, Scott M ^a,b  

^a IEEE   (United States)

^b IBM RESEARCH   (United States)

Author keywords

Lithography; Mask error factor; Photomask

Indexed keywords

APPROXIMATION THEORY; FOURIER TRANSFORMS; IMAGE PROCESSING; INTEGRAL EQUATIONS; LIGHT PROPAGATION; MASKS; PHOTOLITHOGRAPHY; SPECTRUM ANALYSIS;

MASK CRITICAL DIMENSION ERROR; MASK ERROR FACTOR; MASK EXPOSURE DEFOCUS VOLUME; PHOTOMASK FEATURE; TWO DIMENSIONAL EXPOSURE DEFOCUS WINDOW;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0033723105     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.843639     Document Type: Article

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