Reduction of mask induced CD errors by optical proximity correction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 124-130

  Randall, John ^a   Tritchkov, Alexander V ^b   Jonckheere, Rik M ^b   Jaenen, Patrick ^b   Ronse, Kurt G ^b  

^a TEXAS INSTRUMENTS   (United States)

^b IMEC   (Belgium)

Author keywords

Mask critical dimension errors; Mask error factor; Mask error magnification; Mask error reduction; Optical proximity correction; Resist nonlinearity

Indexed keywords

MASK CRITICAL DIMENSION ERRORS; MASK ERROR FACTOR; MASK ERROR MAGNIFICATION; MASK ERROR REDUCTION; OPTICAL PROXIMITY CORRECTION; RESIST NONLINEARITY;

DATA STORAGE EQUIPMENT; ERRORS; FITS AND TOLERANCES; OPTICAL RESOLVING POWER; OPTOELECTRONIC DEVICES;

ERROR CORRECTION;

EID: 0001603544     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310737     Document Type: Conference Paper

References (10)

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3. John Randall, abstract submitted to "International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication" to be held in Chicago, May 1998.
4. MicroUnity Systems Engineering, Inc. 475 Potrero Avenue, Sunnyvale, CA
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6. and J. Fung Chen, Tom Laidig, Kurt Wampler, and Roger Caldwell, To be published JVST-B Nov. 97
7. J. Randall, A. Tritchkov, K. Ronse, and P. Jaenen presented at the Micro- Nano- Engineering Conference, Sept. 1997 Athens Greece.
8. Robert Dean, Proceedings of the 16th Annual Symposium on Photomask Technology and Management (BACUS), Redwood City, California Sept 1996, SPIE 2884 (1996) 302.
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