Impact of spherical aberrations on printing characteristics of irregularly aligned patterns of alternating phase shift mask

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 4 A, 1999, Pages 1919-1926

  Nakao, Shuji ^a   Nakae, Akihiro ^a   Tsujita, Kouichirou ^a   Wakamiya, Wataru ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Alternating phase shift mask; Depth of focus; Optical image calculation; Optical lithography; Pattern layout; Spherical aberration

Indexed keywords

EID: 0011192302     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.1919     Document Type: Article

References (8)

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