Detection and repair of multiphase defects on alternating phase-shift masks for DUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873, Issue pt 1, 1999, Pages 127-137

  Nagashige, Susumu ^a   Hayashi, Koki ^a   Akima, Shinji ^a   Takahashi, Hiroyuki ^a   Chiba, Kazuaki ^a   Yamada, Yoshiro ^a   Matsuzawa, Yuichi ^a  

^a TOPPAN PRINTING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEFECTS; KRYPTON; PHASE SHIFT; PHOTOLITHOGRAPHY; QUALITY CONTROL; REPAIR;

ALTERNATING PHASE SHIFT MASKS; DEFECTS DETECTION; MULTIPHASE DEFECTS;

MASKS;

EID: 0033316205     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373308     Document Type: Conference Paper

References (4)