Understanding systematic and random CD variations using predictive modelling techniques

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue I, 1999, Pages 162-175

  Flagello, Donis G ^a   van der Laan, Hans ^a   van Schoot, Jan ^a   Bouchoms, Igor ^a   Geh, Bernd ^a   Zeiss, Carl ^a  

^a ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; MATHEMATICAL MODELS; MONTE CARLO METHODS;

ACROSS WAFER LINEWIDTH VARIATIONS (AWLV) SIMULATION; CRITICAL DIMENSION (CD) UNIFORMITY;

PHOTOLITHOGRAPHY;

EID: 0032648868     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (5)