Understanding across chip line width variation: the first step toward optical proximity correction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 124-136

  Liebmann, Lars W ^a   Molless, Antoinette F ^a   Ferguson, Richard A ^a   Wong, Alfred K ^a   Mansfield, Scott M ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN; DISTANCE MEASUREMENT; MATHEMATICAL MODELS; PROXIMITY SENSORS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; TESTING;

LINE WIDTH; OPTICAL MICROLITHOGRAPHY; OPTICAL PROXIMITY CORRECTION;

PHOTOLITHOGRAPHY;

EID: 0031382548     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.276015     Document Type: Conference Paper

References (9)