Mask CD control requirement at 0.18-um design rules for 193-nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 164-169

  Yan, Pei yang ^a   Langston, Joseph C ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROL SYSTEMS; DESIGN; DISTANCE MEASUREMENT; MASKS; SEMICONDUCTOR DEVICE MANUFACTURE;

CRITICAL DIMENSIONS; OPTICAL MICROLITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0031357579     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)