Assessment of corner rounding improvement by automatic software correction on laser pattern generator manufactured photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3546, Issue , 1998, Pages 63-73

  Ziegler, Wolfram ^a   Rosenbusch, Anja ^a  

^a SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SOFTWARE; LASER APPLICATIONS; PHOTORESISTS;

CORNER ROUNDING; LASER PATTERN GENERATORS; PHOTOMASKS;

MASKS;

EID: 0032297531     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.332844     Document Type: Conference Paper

References (2)