High resolution ultraviolet defect inspection of DAP reticles darkfield alternate phase

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873, Issue pt 1, 1999, Pages 148-161

  Liebmann, Lars ^a   Mansfield, Scott ^a   Wong, Alfred ^a   Smolinski, Jacek ^a   Peng, Song ^a   Kimmel, Kurt ^a   Rudzinski, Maciej ^a   Wiley, James ^a   Zurbrick, Larry ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; INSPECTION; INTEGRATED CIRCUIT LAYOUT; INTEGRATED CIRCUIT MANUFACTURE; LOGIC CIRCUITS; OPTICAL SYSTEMS; PHASE SHIFT; REPAIR; ULTRAVIOLET RADIATION;

ALTERNATING APERTURE PHASE SHIFT MASKS; DARKFIELD ALTERNATE PHASE RETICLES; HIGH RESOLUTION ULTRAVIOLET DEFECT INSPECTION;

MASKS;

EID: 0033356237     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (0)