New projection optical system for beyond 150nm patterning with KrF and ArF sources

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 414-422

  Hirukawa, Shigeru ^a   Matsumoto, Koichi ^a   Takemasa, Kengo ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

ArF; KrF; Projection optics; Resolution

Indexed keywords

LENSES; MASKS; OPTICAL INSTRUMENTS; OPTICAL SYSTEMS; PHOTOLITHOGRAPHY;

AERIAL IMAGING; ARF; KRF; PROJECTION LENSES; PROJECTION OPTICS; RESOLUTION; TWO TYPES;

KRYPTON;

EID: 0010436834     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310769     Document Type: Conference Paper

References (2)

1. Motegi et.al. Extended Abstracts (the 40th Spring Meeting 1993); the Japan Society of Applied Physics and Related Societies) 568 (in Japanese)
2. K.Matsumoto et.al. Proc. SPIE 2197 (1994) 844