Factors which determine the optimum reduction factor for wafer steppers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue I, 1999, Pages 468-478

  Levinson, Harry J ^a   Ackmann, Paul W ^a   Preil, Moshe E ^a   Rericha, Bill ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; SEMICONDUCTOR DEVICE MANUFACTURE;

STEP-AND-SCAN SYSTEMS; WAFER STEPPERS;

PHOTOLITHOGRAPHY;

EID: 0032632461     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350834     Document Type: Conference Paper

References (17)