Mask Error Factor: Causes and implications for process latitude

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue I, 1999, Pages 250-260

  van Schoot, Jan ^a   Finders, Jo ^a   Schenau, Koen van Ingen ^a   Klaassen, Michel ^a   Buijk, Corine ^a  

^a ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ERROR ANALYSIS; INTEGRATED CIRCUIT LAYOUT; MASKS; MATHEMATICAL MODELS;

MASK ERROR FACTORS (MEF);

PHOTOLITHOGRAPHY;

EID: 0032676111     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.354338     Document Type: Conference Paper

References (12)