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Volumn 8, Issue 30, 2016, Pages 19836-19841

Patterning of Solid Films via Selective Atomic Layer Deposition Based on Silylation and UV/Ozonolysis

Author keywords

area selective ALD; silylation; surface chemistry; UV ozonolysis; XPS

Indexed keywords

ATOMIC LAYER DEPOSITION; DEPOSITION; FILM GROWTH; HAFNIUM OXIDES; LITHOGRAPHY; OZONE; SILICON OXIDES; SILICON WAFERS; SURFACE CHEMISTRY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84982737811     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/acsami.6b07192     Document Type: Article
Times cited : (13)

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