Selective-area atomic layer deposition with microcontact printed self-assembled octadecyltrichlorosilane monolayers as mask layers

Thin Solid Films

Volumn 517, Issue 2, 2008, Pages 972-975

  Färm, Elina ^a   Kemell, Marianna ^a   Ritala, Mikko ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

Author keywords

Iridium; Octadecyltrichlorosilane; Selective area atomic layer deposition; Self assembled monolayer; Titanium oxide

Indexed keywords

ACOUSTIC MICROSCOPES; AMPLITUDE MODULATION; ANGLE MEASUREMENT; ATOMIC PHYSICS; ATOMS; CONTACT ANGLE; ELECTRON ENERGY LEVELS; FIELD EMISSION; IRIDIUM; MISSILE BASES; MONOLAYERS; ORGANIC POLYMERS; PASSIVATION; PHYSICAL VAPOR DEPOSITION; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLED MONOLAYERS; SILANES; SILICON; TITANIUM; TITANIUM OXIDES;

ATOMIC LAYER DEPOSITION (ALD; ATOMIC LAYERS; ELASTOMERIC STAMPS; ENERGY DISPERSIVE; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; MASK LAYERS; OCTADECYLTRICHLOROSILANE; OCTADECYLTRICHLOROSILANE MONOLAYERS; PASSIVATION PROPERTIES; PRINT LINES; SELECTIVE-AREA ATOMIC LAYER DEPOSITION; SELF-ASSEMBLED MONOLAYER; WATER CONTACT ANGLE MEASUREMENTS;

ATOMIC LAYER DEPOSITION;

EID: 55049092027     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.08.191     Document Type: Article

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