A brief review of atomic layer deposition: From fundamentals to applications

Materials Today

Volumn 17, Issue 5, 2014, Pages 236-246

  Johnson, Richard W ^a   Hultqvist, Adam ^a   Bent, Stacey F ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; FILMS; INDUSTRIAL RESEARCH; SOLID OXIDE FUEL CELLS (SOFC); VAPOR DEPOSITION; ZIRCONIA;

CONFORMALITY; CU(IN , GA)SE2; FILM COMPOSITION; HIGH ASPECT RATIO STRUCTURES; METAL OXIDES; RESEARCH APPLICATIONS; SOLAR CELL DEVICES; UNIQUE FEATURES;

ATOMIC LAYER DEPOSITION;

EID: 84902074912     PISSN: 13697021     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mattod.2014.04.026     Document Type: Review

References (101)

1. S.M. George Chem. Rev. 110 1 2009 111 131
2. M. Knez, K. Nielsch, and L. Niinistö Adv. Mater. 19 21 2007 3425 3438
3. M. Leskelä, and M. Ritala Angew. Chem. Int. Ed. 42 45 2003 5548 5554
4. R.L. Puurunen J. Appl. Phys. 97 12 2005 121301-121301-52
5. V. Miikkulainen et al. J. Appl. Phys. 113 2 2013 021301-1-021301-101
6. H. Kim J. Vac. Sci. Technol. B: Microelectron. Nanometer Struct. 21 6 2003 2231 2261
7. M. Leskelä, and M. Ritala Thin Solid Films 409 1 2002 138 146
8. J.A. An Delft, D. Garcia-Alonso, and W.M.M. Kessels Semicond. Sci. Technol. 27 7 2012 074002
9. T.J. Knisley, L.C. Kalutarage, and C.H. Winter Coord. Chem. Rev. 257 23-24 2013 3222 3231
10. J.R. Bakke et al. Nanoscale 3 9 2011 3482 3508
11. T. Suntola, J. Antson, inventors, Method for producing compound thin films, Patent 4058430, November 15, 1977.
12. M. Ritala, and J. Niinistö Chemical Vapour Deposition: Precursors, Processes and Applications 2009 Royal Society of Chemistry
13. A. Hultqvist, M. Edoff, and T. Törndahl Prog. Photovoltaics Res. Appl. 19 4 2011 478 481
14. A. Kosola et al. Appl. Surf. Sci. 211 1 2003 102 112
15. M. Vehkamäki et al. Electrochem. Solid-state Lett. 2 10 1999 504 506
16. S.D. Elliott, and O. Nilsen ECS Trans. 41 2 2011 175 183
17. H. Wang et al. Electrochem. Solid-State Lett. 12 4 2009 G13 G15
18. A. Van Gorkum, K. Nakagawa, and Y. Shiraki J. Appl. Phys. 65 6 1989 2485 2492
19. F. Werner et al. Appl. Phys. Lett. 97 2010 162103
20. P. Poodt et al. J. Vac. Sci. Technol. A 30 1 2012 010802-010802-11
21. D.H. Levy, S.F. Nelson, and D. Freeman J. Display Technol. 5 12 2009 484 494
22. D.H. Levy et al. Appl. Phys. Lett. 92 19 2008 192101-192101-3
23. P. Poodt et al. Adv. Mater. 22 32 2010 3564 3567
24. P. Poodt et al. J. Electrochem. Soc. 158 9 2011 H937 H940
25. J. Hämäläinen et al. Chem. Mater. 24 1 2011 55 60
26. J. Yum et al. J. Appl. Phys. 109 6 2011 064101-064101-4
27. K. Uusi-Esko, and M. Karppinen Chem. Mater. 23 7 2011 1835 1840
28. I. Povey et al. Appl. Phys. Lett. 89 10 2006 104103-1-104103-3
29. H.B. Park et al. J. Appl. Phys. 94 2003 3641
30. V. Pore et al. J. Am. Chem. Soc. 131 10 2009 3478 3480
31. S. Ha, E. Choi, and S. Kim Thin Solid Films 476 2 2005 252 257
32. J.S. Lim et al. ICVC '99 6th International Conference 1999 506 509
33. C. Auth et al. 2012 Symposium on VLSI Technology (VLSIT) 2012 131 132
34. K. Mistry et al. Electron Devices Meeting 2007, IEDM 2007 2007 IEEE International 247 250
35. K.J. Kuhn IEEE Trans. Electron Dev. 59 7 2012 1813 1828
36. S. Hyun et al. 2011 Symposium on VLSI Technology (VLSIT) 2011 32 33
37. S. Narasimha et al. Electron Devices Meeting (IEDM), 2012 IEEE International 2012 3.3.1-3.3.4
38. F. Koehler et al. IOP Conference Series: Materials Science and Engineering, vol. 41(1) 2012 012006
39. C.H. Tsai et al. 2012 International Symposium on VLSI Technology Systems and Applications (VLSI-TSA) 2012 1 2
40. F.-L. Yang et al. Electron Devices Meeting, 2002 IEDM '02 International 2002 255 258
41. J.-T. Park, J. Colinge, and C.H. Diaz IEEE Electron Dev. Lett. 22 8 2001 405 406
42. S. Bangsaruntip et al. 2010 Symposium on VLSI Technology (VLSIT) 2010 21 22
43. V. Elshocht Electron Devices Meeting 2008, IEDM 2008, IEEE International 2008 1 4
44. Z.-Y. Xie et al. 2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology (ICSICT) 2012 1 3
45. S. Shen et al. Appl. Phys. Lett. 98 17 2011 172902-1-172902-3
46. C.K. Chiang et al. Reliability Physics Symposium (IRPS), 2012 IEEE International 2012 GD.3.1-GD.3.4
47. J. Hwan Han et al. Semiconductor Device Research Symposium (ISDRS), 2011 International 2011 1 2
48. K. Tomida et al. IOP Conference Series: Materials Science and Engineering, vol. 8(1) 2010 012023
49. C.-W. Chen et al. IEEE Electron Dev. Lett. 33 12 2012 1678 1680
50. B. Liu et al. IEEE Trans. Electron Dev. 60 6 2013 1852 1860
51. M. Radosavljevic et al. Electron Devices Meeting (IEDM), 2010 IEEE International 2010 6.1.1-6.1.4
52. P.D. Ye J. Vac. Sci. Technol. A 26 4 2008 697 704
53. M. Radosavljevic et al. Electron Devices Meeting (IEDM), 2009 IEEE International 2009 1 4
54. S. Siddiqui et al. ECS Trans. 53 3 2013 137 146
55. R.M. Wallace et al. MRS Bull. 34 7 2009 493
56. W. Wang et al. Microelectron. Eng. 88 7 2011 1061 1065
57. B. Fallahazad et al. Appl. Phys. Lett. 100 9 2012 093112
58. H. Fang et al. Nano Lett. 12 7 2012 3788 3792
59. A.D. Franklin et al. Nano Lett. 13 6 2013 2490 2495
60. L.-J. Chen et al. IEEE Trans. Nanotechnol. 10 2 2011 260 265
61. J. Benick et al. Appl. Phys. Lett. 92 25 2008 253504-1-253504-3
62. H. Schmidt et al. Appl. Phys. Lett. 96 24 2010 243305-1-243305-3
63. E. Palomares et al. J. Am. Chem. Soc. 125 2 2003 475 482
64. K. An et al. J. Nanosci. Nanotechnol. 8 9 2008 4856 4859
65. A.B.F. Martinson et al. Appl. Phys. Lett. 94 12 2009 123107-1-123107-3
66. N.P. Dasgupta et al. Nano Lett. 11 3 2011 934 940
67. T.P. Brennan et al. Adv. Energy Mater. 1 6 2011 1169 1175
68. M. Kapilashrami et al. Phys. Chem. Chem. Phys. 14 29 2012 10154 10159
69. S. Niki et al. Prog. Photovoltaics Res. Appl. 18 6 2010 453 466
70. A. Niemegeers, M. Burgelman, and A. De Vos Appl. Phys. Lett. 67 6 1995 843 845
71. J. Lindahl et al. Prog. Photovoltaics Res. Appl. 21 8 2013 1588 1597
72. N. Naghavi et al. Prog. Photovoltaics Res. Appl. 18 6 2010 411 433
73. V. Lujala et al. Appl. Surf. Sci. 82-83 0 1994 34 40
74. E.B. Yousfi et al. Thin Solid Films 361-362 0 2000 183 186
75. T. Törndahl et al. Prog. Photovoltaics Res. Appl. 15 3 2007 225 235
76. N. Naghavi et al. Prog. Photovoltaics Res. Appl. 11 7 2003 437 443
77. K. Ramanathan et al. Comparative Study of Zn(O,S) Buffer Layers and CIGS Solar Cells Fabricated By CBD, ALD, and Sputtering 2012 NREL Report No. CP-5200-54138
78. T. Nakada et al. IEEE J. Photovoltaics 3 1 2013 461 466
79. N. Naghavi et al. Thin Solid Films 519 21 2011 7600 7605
80. K. Nakashima et al. Jpn. J. Appl. Phys. 51 2012 10NC15
81. C. Lee, Y.M. Shin, and B.T. Ahn ECS Trans. 41 4 2011 213 219
82. J. Rousset et al. Sol. Energy Mater. Sol. Cells 95 6 2011 1544 1549
83. A. Hultqvist et al. Prog. Photovoltaics Res. Appl. 20 7 2012 883 891
84. P. Genevee et al. J. Vac. Sci. Technol. A 31 1 2013 01A131
85. D.A.R. Barkhouse et al. Appl. Phys. Lett. 100 19 2012 193904-1-193904-5
86. P. Sinsermsuksakul et al. Appl. Phys. Lett. 102 5 2013 053901-1-053901-5
87. Y. Lee et al. Energy Environ. Sci. 6 2013 2112 2118
88. D. Beckel et al. J. Power Sources 173 1 2007 325 345
89. H. Huang et al. J. Electrochem. Soc. 154 1 2007 B20 B24
90. X. Jiang et al. Chem. Mater. 20 12 2008 3897 3905
91. J. An, Y. Kim, and F.B. Prinz Phys. Chem. Chem. Phys. 15 20 2013 7520 7525
92. J.H. Shim et al. Chem. Mater. 19 15 2007 3850 3854
93. C. Brahim et al. Appl. Surf. Sci. 253 8 2007 3962 3968
94. K. Sik Son et al. J. Vac. Sci. Technol. A 31 1 2013 01A107-1-01A107-4
95. J.H. Shim et al. Chem. Mater. 21 14 2009 3290 3296
96. C. Bernay et al. J. Phys. Chem. Solids 64 9 2003 1761 1770
97. A. Evans et al. J. Power Sources 194 1 2009 119 129
98. C. Chao et al. ACS Nano 7 3 2013 2186 2191
99. B. Steele Solid State Ionics 75 1995 157 165
100. X. Jiang, R. Chen, and S.F. Bent Surf. Coat. Technol. 201 22 2007 8799 8807
101. R. Chen, and S.F. Bent Adv. Mater. 18 8 2006 1086 1090