Area-Selective Atomic Layer Deposition: Conformal Coating, Subnanometer Thickness Control, and Smart Positioning

ACS Nano

Volumn 9, Issue 9, 2015, Pages 8651-8654

  Fang, Ming ^a   Ho, Johnny C ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; DIELECTRIC FILMS; FIELD EFFECT TRANSISTORS; METALS; MOS DEVICES; OXIDE SEMICONDUCTORS; THICKNESS CONTROL;

COMPLEMENTARY METAL OXIDE SEMICONDUCTORS; CONFORMAL DEPOSITION; DEVICE FABRICATIONS; DEVICE PERFORMANCE; ENABLING TECHNOLOGIES; SELECTIVE DEPOSITION; TECHNOLOGICAL BREAKTHROUGHS; THREEDIMENSIONAL (3-D);

ATOMIC LAYER DEPOSITION;

EID: 84942284309     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/acsnano.5b05249     Document Type: Review

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