Thermal chemistry of copper acetamidinate atomic layer deposition precursors on silicon oxide surfaces studied by XPS

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 34, Issue 1, 2016, Pages

  Yao, Yunxi ^a   Zaera, Francisco ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; ATOMS; BINDING ENERGY; COPPER; COPPER COMPOUNDS; DEPOSITION; DIMERS; IODINE; LIGANDS; MOLECULAR OXYGEN; OXIDE FILMS; SILICON OXIDES; SURFACE CHEMISTRY;

CRYOGENIC TEMPERATURES; INITIAL ADSORPTION; METAL-ORGANIC COMPLEXES; SILICON OXIDE LAYERS; SILICON OXIDE SURFACES; SURFACE NUCLEATION; THERMAL CHEMISTRY; ULTRAHIGH VACUUM CONDITIONS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84938633876     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4927843     Document Type: Article

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