Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST

ACS Applied Materials and Interfaces

Volumn 7, Issue 24, 2015, Pages 13476-13483

  Cushen, Julia ^a   Wan, Lei ^a   Blachut, Gregory ^b   Maher, Michael J ^c   Albrecht, Thomas R ^a   Ellison, Christopher J ^b   Willson, C Grant ^b,c   Ruiz, Ricardo ^a  

^a WESTERN DIGITAL CORPORATION   (United States)

^b The University of Texas at Austin   (United States)

^c University of Texas at Austin   (United States)

Author keywords

block copolymer; chemical contrast patterns; density multiplication; directed self assembly; sidewall guiding; silicon containing; top coat

Indexed keywords

BLOCK COPOLYMERS; COPOLYMERS; CROSSLINKING; SELF ASSEMBLY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON;

BIT-PATTERNED MEDIA; CHEMICAL CONTRAST; CROSS-LINKED POLYSTYRENE; DIRECTED SELF-ASSEMBLY; HIGH VOLUME MANUFACTURING; SEMICONDUCTOR INDUSTRY; SIDEWALL-GUIDING; TOP-COATS;

REACTIVE ION ETCHING;

EID: 84932608199     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/acsami.5b02481     Document Type: Article

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