Advanced plasma etch technologies for nanopatterning

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 12, Issue 4, 2013, Pages

  Wise, Rich ^a  

^a IBM RESEARCH   (United States)

Author keywords

atomic layer etch; defectivity; plasma etch; sidewall image transfer; surface integrity

Indexed keywords

INFORMATION TECHNOLOGY; PLASMA ETCHING; PLASMAS;

ACROSS-WAFER UNIFORMITY; ATOMIC LAYER; DEFECTIVITY; DRY PLASMA ETCH PROCESS; IMMERSION LITHOGRAPHY; PATTERNING TECHNOLOGY; SIDEWALL IMAGE TRANSFERS; SURFACE INTEGRITY;

PLASMA STABILITY;

EID: 84892178851     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.JMM.12.4.041311     Document Type: Article

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