Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 11, Issue 3, 2012, Pages

  Delgadillo, Paulina A Rincon ^a,b   Gronheid, Roel ^b   Thode, Christopher J ^a   Wu, Hengpeng ^c   Cao, Yi ^c   Neisser, Mark ^c   Somervell, Mark ^d   Nafus, Kathleen ^d   Nealey, Paul F ^a  

^a University of Wisconsin Madison   (United States)

^b IMEC   (Belgium)

^c AZ Electronic Materials   (United States)

^d TOKYO ELECTRON AMERICA INC   (United States)

Author keywords

193 nm immersion; block copolymer; chemo epitaxy; directed self assembly; lamellar phase

Indexed keywords

BLOCK COPOLYMERS; LITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; SEMICONDUCTOR DEVICE MANUFACTURE;

193-NM IMMERSION; CHEMICAL PATTERN; CHEMO-EPITAXY; DEPOSITED FILMS; DEPTH OF FOCUS; DIRECTED SELF-ASSEMBLY; EDGE BEAD; EXPOSURE LATITUDE; FINE TUNING; LAMELLAR PHASE; NANOPATTERNED SUBSTRATES; PROCESS CONDITION; PROCESS WINDOW; SCANNING ELECTRON MICROSCOPE; SEMICONDUCTOR INDUSTRY; TOPDOWN; WAFER PROCESSING EQUIPMENT;

EPITAXIAL GROWTH;

EID: 84863763245     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.JMM.11.3.031302     Document Type: Article

References (23)

1. I.T.R.S., Lithography, http://www.itrs.net/links/2010itrs/home2010.htm (2010)
2. Bates, F. S. and G. H. Fredrickson, Block copolymers-designer soft materials., Phys. Today 52 (2), 32-38 (1999). 0031-9228 10.1063/1.882522
3. Kim, S. O. et al., Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates., Nature 424 (6947), 411-414 (2003). 0028-0836 10.1038/nature01775
4. Ruiz, R. et al., Density multiplication and improved lithography by directed block copolymer assembly., Science 321 (5891), 936-939 (2008). 0036-8075 10.1126/science.1157626
5. Cheng, J. Y. et al., Dense self-assembly on sparse chemical patterns: Rectifying and multiplying lithographic patterns using block copolymers., Adv. Mater. 20 (16), 3155-3158 (2008). 0935-9648 10.1002/adma.v20:16
6. Stoykovich, M. P. et al., Remediation of line edge roughness in chemical nanopatterns by the directed assembly of overlying block copolymer films., Macromolecules 43 (5), 2334-2342 (2010). 0024-9297 10.1021/ma902494v
7. Bosse, A. W., Effects of segregation strength and an external field on the thermal line edge and line width roughness spectra of a diblock copolymer resist., J. Vac. Sci. Technol. B 29 (3), 31803 (2011). 0734-211X 10.1116/1.3581107
8. Chi-Chun, L. et al., Integration of block copolymer directed assembly with 193 immersion lithography., J. Vac. Sci. Technol. B 28 (6), C6B30-C6B34 (2010). 0734-211X 10.1116/1.3501348
9. Bencher, C. et al., Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab., Proc. SPIE 7970, 79700F (2011). 0277-786X 10.1117/12.881293
10. Sanders, D. P. et al., Integration of directed self-assembly with 193nm lithography., J. Photopolym. Sci. Technol. 23 (1), 11-18 (2010). 0914-9244 10.2494/photopolymer.23.11
11. Cheng, J. Y. et al., Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist., ACS Nano. 4 (8), 4815-4823 (2010). 1936-0851 10.1021/nn100686v
12. Gronheid, R. et al., Frequency multiplication of lamellar phase block co-polymers with grapho-epitaxy directed self-assembly-sensitivity to pre-pattern., in press (2011).
13. Han, E. et al., Graphoepitaxial assembly of symmetric block copolymers on weakly preferential substrates., Adv. Mater. 22 (38), 4325-4329 (2010). 0935-9648 10.1002/adma.201001669
14. Edwards, E. W. et al., Precise control over molecular dimensions of block-copolymer domains using the interfacial energy of chemically nanopatterned substrates., Adv. Mater. 16 (15), 1315-1319 (2004). 0935-9648 10.1002/(ISSN)1521-4095
15. Edwards, E. W. et al., Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates., J. Polym. Sci. B 43 (23), 3444-3459 (2005). 0887-6266 10.1002/(ISSN)1099-0488
16. Edwards, E. W. et al., Dimensions and shapes of block copolymer domains assembled on lithographically defined chemically patterned substrates., Macromolecules 40 (1), 90-96 (2007). 0024-9297 10.1021/ma0607564
17. Detcheverry, F. A. et al., Interpolation in the directed assembly of block copolymers on nanopatterned substrates: simulation and experiments., Macromolecules 43 (7), 3446-3454 (2010). 0024-9297 10.1021/ma902332h
18. Harrison, C. et al., Dynamics of pattern coarsening in a two-dimensional smectic system., Phys. Rev. E 66 (1), 011706 (2002). 1063-651X 10.1103/PhysRevE.66.011706
19. Welander, A. M. et al., Rapid directed assembly of block copolymer films at elevated temperatures., Macromolecules 41 (8), 2759-2761 (2008). 0024-9297 10.1021/ma800056s
20. Liu, C.-C. et al., Towards an all-track 300mm process for directed self-assembly., J. Vac. Sci. Technol. B 29 (6), 06F203 (2011). 0734-211X
21. Liu, C.-C. et al., Fabrication of lithographically defined chemically patterned polymer brushes and mats., Macromolecules 44 (7), 1876-1885 (2011). 0024-9297 10.1021/ma102856t
22. Liu, G. L. et al., Cross-sectional imaging of block copolymer thin films on chemically patterned surfaces., J. Photopolym. Sci. Technol. 23 (2), 149-154 (2010). 0914-9244 10.2494/photopolymer.23.149
23. Liu, C.-C. et al., Free energy minimization for directed self-assembly of block copolymers with density multiplication., In preparation.