Scaling-down lithographic dimensions with block-copolymer materials: 10-nm-sized features with poly(styrene)-block-poly(methylmethacrylate)

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 12, Issue 3, 2013, Pages

  Chevalier, Xavier ^a,b   Nicolet, Célia ^a,c   Tiron, Raluca ^b   Gharbi, Ahmed ^b   Argoud, Maxime ^b   Pradelles, Jonathan ^b   Delalande, Michael ^b   Cunge, Gilles ^b   Fleury, Guillaume ^c   Hadziioannou, Georges ^c   Navarro, Christophe ^a  

^a ARKEMA   (France)

^b CEA GRENOBLE   (France)

^c UNIVERSITÉ DE BORDEAUX   (France)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; MICROELECTRONICS; SELF ASSEMBLY; STYRENE;

FEATURE SIZES; INDUSTRIAL SCALE; INTEGRATION CAPABILITY; LITHOGRAPHIC DIMENSIONS; METALLIC CONTENT; METHYL METHACRYLATES; POLYMER MATERIALS; VARIOUS SUBSTRATES;

POLYMERS;

EID: 84892739639     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.JMM.12.3.031102     Document Type: Article

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