On the characterization of ultra-precise x-ray optical components: Advances and challenges in ex situ metrology

Journal of Synchrotron Radiation

Volumn 21, Issue 5, 2014, Pages 968-975

  Siewert, F ^a   Buchheim, J ^a   Zeschke, T ^a   Stormer M ^b   Falkenberg, G ^c   Sankari, R ^d  

^a HAHN MEITNER INSTITUT   (Germany)

^b INSTITUTE OF MATERIALS RESEARCH   (Germany)

^c DESY   (Germany)

^d LUND UNIVERSITY   (Sweden)

Author keywords

focusing mirrors; metrology for synchrotron optics; multilayer; NOM; slope measurement; synchrotron optics; X ray optics

Indexed keywords

COATINGS; FREE ELECTRON LASERS; LIGHT SOURCES; MIRRORS; MULTILAYERS;

DIFFRACTION LIMITED; FOCUSING MIRRORS; NOM; QUALITY REQUIREMENTS; SLOPE MEASUREMENT; SYNCHROTRON OPTICS; THIN FILM FABRICATION; X-RAY REFLECTOMETRY;

UNITS OF MEASUREMENT;

EID: 84919951673     PISSN: 09090495     EISSN: 16005775     Source Type: Journal    
DOI: 10.1107/S1600577514016221     Document Type: Article

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