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1
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0001592123
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Improvement of synchrotron radiation mirrors below the 0,1 arcsec rms error limit with the help of a long trace profiler
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San Diego
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H. Lammert, F. Senf, M. Berger, Improvement of Synchrotron radiation Mirrors below the 0,1 arcsec rms Error Limit with the Help of a Long Trace Profiler, SPIE's Proc. Vol. 3152, p 168-179, San Diego, 1997
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31844444428
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Nanometer optical components for synchrotron radiation
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Berlin
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Heiner Lammert, Nanometer Optical Components for Synchrotron Radiation, BEESY annual report 2001, www.bessy.de, p 301-305, Berlin 2002
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(2002)
BEESY Annual Report 2001
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Lammert, H.1
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3
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31844436862
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Optical SR components below the 0.1 arcsec limit: The key for this accuracy is the measurement technique
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Grenoble
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Heiner Lammert, Frank Siewert, Optical SR components below the 0.1 arcsec limit: The key for this accuracy is the measurement technique, Second International Workshop on Metrology for X-ray Optics, Grenoble 2004
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(2004)
Second International Workshop on Metrology for X-ray Optics
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Lammert, H.1
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4
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31844435227
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United States Patent 4884697
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Takacs, P.Z., Qian, S., United States Patent 4884697, 1989
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Takacs, P.Z.1
Qian, S.2
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5
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0035928317
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Future metrology needs for synchrotron radiation grazing-incidence optics
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SRI2000
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Assooufid, L., Hignette, O., Howells, M., Irick, S., Lammert, H., Takacs, P. Future metrology needs for synchrotron radiation grazing-incidence optics, SRI2000, Nuclear Instruments and Methods in Physics Research, A 467-468, 2000, 399-403
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Nuclear Instruments and Methods in Physics Research, A
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Assooufid, L.1
Hignette, O.2
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Irick, S.4
Lammert, H.5
Takacs, P.6
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6
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31844454598
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MOELLER-WEDEL OPTICAL GmbH, www.moeller-wedel-optical.com
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7
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31844438542
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The nanometer optical component measuring machine - NOM- at BESSY
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Berlin
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Heiner Lammert, Tino Noll, Thomas Schlegel, Frank Siewert, Thomas Zeschke, The Nanometer Optical Component Measuring Machine - NOM- at BESSY, BESSY annual report 2002, www.bessy.de, p 399-402, Berlin 2003
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BESSY Annual Report 2002
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Lammert, H.1
Noll, T.2
Schlegel, T.3
Siewert, F.4
Zeschke, T.5
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8
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77950850815
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The nanometer optical component measuring machine: A new sub-nm topography measuring device for X-ray optics at BESSY
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Mellville, New York
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Frank Siewert, Tino Noll, Thomas Schlegel, Thomas Zeschke and Heiner Lammert, The Nanometer Optical Component Measuring Machine: a new Sub-nm Topography Measuring Device for X-ray Optics at BESSY, Mellville, New York, 2004, AIP Conference Proceedings, Volume 705, p. 847-850
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AIP Conference Proceedings
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Siewert, F.1
Noll, T.2
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Zeschke, T.4
Lammert, H.5
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9
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31844456819
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The BESSY-NOM (Nanometer optical component measuring Machine) a non contact Deflectometry Sub-nm Topography measuring Device for X-ray Optics
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Grenoble
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Frank Siewert, Tino Noll, Thomas Schlegel, Thomas Zeschke and Heiner Lammert, The BESSY-NOM (Nanometer optical component measuring Machine) a non contact Deflectometry Sub-nm Topography measuring Device for X-ray Optics, Second International Workshop on Metrology for X-ray Optics, Grenoble 2004
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(2004)
Second International Workshop on Metrology for X-ray Optics
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Siewert, F.1
Noll, T.2
Schlegel, T.3
Zeschke, T.4
Lammert, H.5
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10
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0242304816
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Calibration of high-resolution electronic autocollimators aginst an angle comparator
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A. Just, M. Krause, R. Probst, R. Wittekopf, Calibration of high-resolution electronic autocollimators aginst an angle comparator, Metrologia 40 (2003) 288-294
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(2003)
Metrologia
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Just, A.1
Krause, M.2
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11
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31844451197
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Jahrestagung der DGaO, Münster
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I. Weingärtner, C. Elster, J. Gerhardt, H. Winkler, M. Schulz, C. Hellwig, I. Rieck, E. Lehberger, Stitching-Verfahren und Stitching- Interferometrie, 104. Jahrestagung der DGaO, Münster 2003
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Stitching-verfahren und Stitching-Interferometrie
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Weingärtner, I.1
Elster, C.2
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Schulz, M.5
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Rieck, I.7
Lehberger, E.8
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13
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0036987049
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Sun-nm topography measurement by deflectometry: Flatness standard and wafer nanotopography
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R.D. Geckeler, I. Weingärtner, Sun-nm topography measurement by deflectometry: flatness standard and wafer nanotopography, Proc. SPIE, 4779, 1-12, 2002
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(2002)
Proc. SPIE
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Geckeler, R.D.1
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14
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31844456274
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San Diego, this conference
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M. Thomasset, D. Cocco, F. Siewert, A. Rommeveaux, V. Schoenherr, First report on a European round robin for slope measuring profilers, San Diego 2005, this conference
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(2005)
First Report on a European Round Robin for Slope Measuring Profilers
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Thomasset, M.1
Cocco, D.2
Siewert, F.3
Rommeveaux, A.4
Schoenherr, V.5
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15
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1842556549
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Finishing procedure for high performance synchrotron optics
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San Diego, Ca
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th Annual Meeting, San Diego, Ca, 2003
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(2003)
th Annual Meeting
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Schindler, A.1
Haensel, T.2
Nickel, A.3
Thomas, H.J.4
Lammert, H.5
Siewert, F.6
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16
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31844443827
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Ion beam figuring surface finishing of x-ray and synchrotron beam line optics using stitching interferometry for the surface topology measurement
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T. Hansel, A. Nickel, A. Schindler, H.J. Thomas, Ion beam figuring surface finishing of x-ray and synchrotron beam line optics using stitching interferometry for the surface topology measurement, OCIS codes: 220.4610 Optical fabrication, 340.7470 X-ray mirrors
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OCIS Codes: 220.4610 Optical Fabrication, 340.7470 X-ray Mirrors
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Hansel, T.1
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Schindler, A.3
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17
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31844434573
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Breakthrough in the metrology and manufacture of optical components for synchrotron radiation
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Berlin
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Heiner Lammert, Tino Noll, Thomas Schlegel, Fres Senf, Frank Siewert, Thomas Zeschke, Breakthrough in the Metrology and Manufacture of Optical Components for Synchrotron Radiation, BESSY Annual Report 2003, www.bessy.de, Berlin 2004
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(2004)
BESSY Annual Report 2003
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Lammert, H.1
Noll, T.2
Schlegel, T.3
Senf, F.4
Siewert, F.5
Zeschke, T.6
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18
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31844448341
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NOM measurement supported ion beam finishing of a plane-elliptical refocussing mirror for the UE52-SGM1 beamline at BESSY
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Berlin
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Frank Siewert, Kai Godehusen, Heiner Lammert, Thomas Schlegel, Fred Senf, Thomas Zeschke, Thomas Hänsel, Andreas Nickel, Axel Schindler, NOM measurement supported ion beam finishing of a plane-elliptical refocussing mirror for the UE52-SGM1 beamline at BESSY, BESSY Annual Report 2003, www.bessy.de, Berlin 2004
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(2004)
BESSY Annual Report 2003
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Siewert, F.1
Godehusen, K.2
Lammert, H.3
Schlegel, T.4
Senf, F.5
Zeschke, T.6
Hänsel, T.7
Nickel, A.8
Schindler, A.9
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19
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0037762078
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A microfocus imaging system
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Berlin
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K. Holldack, T. Zeschke, F. Senf, C. Jung, R. Follath, D. Ponwitz, A Microfocus Imaging System, BESSY annual report, www.bessy.de, p. 336-338, Berlin 2000
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(2000)
BESSY Annual Report
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Holldack, K.1
Zeschke, T.2
Senf, F.3
Jung, C.4
Follath, R.5
Ponwitz, D.6
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