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Volumn 67, Issue 7, 2014, Pages 989-996

Recent advances using guanidinate ligands for Chemical Vapour Deposition (CVD) and Atomic Layer Deposition (ALD) applications

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; DEPOSITION; LIGANDS; METAL COMPLEXES; THIN FILMS; VAPORS;

EID: 84904430279     PISSN: 00049425     EISSN: 14450038     Source Type: Journal    
DOI: 10.1071/CH14172     Document Type: Review
Times cited : (32)

References (36)
  • 2
    • 84866952953 scopus 로고    scopus 로고
    • doi:10.1039/ C2CS35180C
    • F. T. Edelmann, Chem. Soc. Rev. 2012, 41, 7657. doi:10.1039/ C2CS35180C
    • (2012) Chem. Soc. Rev , vol.41 , pp. 7657
    • Edelmann, F.T.1
  • 9
    • 17444387436 scopus 로고    scopus 로고
    • The insertion of carbodiimides into Al and Ga amido linkages. Guanidinates and mixed amido guanidinates of aluminum and gallium
    • DOI 10.1021/ic048433g
    • A. P. Kenney, G. P. A. Yap, D. S. Richeson, S. T. Barry, Inorg. Chem. 2005, 44, 2926. doi:10.1021/IC048433G (Pubitemid 40544995)
    • (2005) Inorganic Chemistry , vol.44 , Issue.8 , pp. 2926-2933
    • Kenney, A.P.1    Yap, G.P.A.2    Richeson, D.S.3    Barry, S.T.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.