Growth and crystallization of TiO2 thin films by atomic layer deposition using a novel amido guanidinate titanium source and tetrakis-dimethylamido-titanium

Chemistry of Materials

Volumn 25, Issue 15, 2013, Pages 2934-2943

  Reiners, Marcel ^a   Xu, Ke ^b   Aslam, Nabeel ^a   Devi, Anjana ^b   Waser, Rainer ^a,c   Hoffmann Eifert, Susanne ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b RUHR UNIVERSITY BOCHUM   (Germany)

^c RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

atomic layer deposition (ALD); brookite; crystallization; crystallization kinetics, anatase; guanidinate; rutile; titanium oxide (TiO2)

Indexed keywords

BROOKITE; DEPOSITION TEMPERATURES; GUANIDINATES; LIQUID INJECTIONS; PROCESS CONDITION; RUTILE; TEMPERATURE STABILITY; TIO;

AMORPHOUS FILMS; ASPECT RATIO; CARBON FILMS; CRYSTALLIZATION; CRYSTALLIZATION KINETICS; DEPOSITION; FILM GROWTH; OXIDE MINERALS; TITANIUM; TITANIUM DIOXIDE;

ATOMIC LAYER DEPOSITION;

EID: 84882252687     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm303703r     Document Type: Article

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