Heteroleptic guanidinate- and amidinate-based complexes of hafnium as new precursors for MOCVD of HfO2

European Journal of Inorganic Chemistry

Volumn , Issue 11, 2010, Pages 1679-01688

  Xu, Ke ^a   Milanov, Andrian P ^a   Winter, Manuela ^a   Barreca, Davide ^b   Gasparotto, Alberto ^b   Becker, Hans Werner ^a   Devi, Anjana ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b UNIVERSITY OF PADOVA   (Italy)

Author keywords

Chemical vapor deposition; Hafnium oxide; Precursors; Thin films

Indexed keywords

BACKSCATTERING; CARBON FILMS; CHEMICAL STABILITY; FILM GROWTH; HAFNIUM OXIDES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OXIDE FILMS; OXYGEN; SINGLE CRYSTALS; SPECTROSCOPIC ANALYSIS; SYNTHESIS (CHEMICAL); X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

AMIDINATES; CHEMICAL VAPOUR DEPOSITION; GUANIDINATES; HETEROLEPTIC; HETEROLEPTIC COMPLEXES; METAL-ORGANIC CHEMICAL VAPOUR DEPOSITIONS; PRECURSOR; SPECTROSCOPIC METHOD; SYNTHESIS AND CHARACTERIZATIONS; THIN-FILMS;

THIN FILMS;

EID: 77951533605     PISSN: 14341948     EISSN: 10990682     Source Type: Journal    
DOI: 10.1002/ejic.200901225     Document Type: Article

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