Homoleptic gadolinium guanidinate: A single source precursor for metal-organic chemical vapor deposition of gadolinium nitride thin films

Journal of the American Chemical Society

Volumn 131, Issue 47, 2009, Pages 17062-17063

  Milanov, Andrian P ^a   Thiede, Tobias B ^a   Devi, Anjana ^a   Fischer, Roland A ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL EQUATIONS; GADOLINIUM NITRIDE; GAS-PHASE DEPOSITION TECHNIQUES; GUANIDINATES; HOMOLEPTIC; METALORGANIC CHEMICAL VAPOR DEPOSITION; MOCVD GROWTH; NITRIDE THIN FILMS; SINGLE-SOURCE PRECURSOR;

CHEMICAL REACTIONS; GADOLINIUM; INERT GASES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NITRIDES; ORGANIC CHEMICALS; THIN FILMS;

DEPOSITION;

GADOLINIUM; GADOLINIUM GUANIDINATE; GADOLINIUM NITRIDE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL STRUCTURE; ELECTROSPRAY MASS SPECTROMETRY; FILM; MATERIAL COATING; REACTION ANALYSIS; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY; SYNTHESIS;

EID: 72249111969     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja907952g     Document Type: Article

References (21)

1. (a) Khazen, K.; von Bardeleben, H. J.; Cantin, J. L.; Bittar, A.; Granville, S.; Trodahl, H. J.; Ruck, B. J. Phys. Rev. B 2006, 74, 245330.
2. (b) Leuenberger, F.; Parge, A.; Felsch, W.; Fauth, K.; Hessler, M. Phys. Rev. B 2005, 72, 014427.
3. (a) Gerlach, J. W.; Menning, J.; Rauschenbach, B. Appl. Phys. Lett. 2007, 90, 061919.
4. (b) McKenzie, W. R.; Munroe, P. R.; Budde, F.; Ruck, B. J.; Granville, S.; Trodahl, H. J. Curr. Appl. Phys. 2006, 6, 407.
5. (c) Scarpulla, M. A.; Gallinat, C. S.; Mack, S.; Speck, J. S.; Gossard, A. C. J. Cryst. Growth 2009, 311, 1239.
6. Jones; A. C.; Hitchman, M. L. In Chemical Vapor Deposition: Precursors, Processes and Applications; Jones, A. C., Hitchman, M. L., Eds.; RSC: Cambridge, UK, 2009; Chapter 1.
7. (a) Leskelä, M.; Ritala, M. Angew. Chem., Int. Ed. 2003, 42, 5548.
8. (b) Knez, M.; Nielsch, K.; Niinistö, L. Adv. Mater. 2007, 19, 3425.
9. Selected references on SSPs: (a) Shin, J.; Waheed, A.; Agapiou, K.; Winkenwerder, W. A.; Kim, H.-W.; Jones, R. A.; Hwang, G. S.; Ekerdt, J. G. J. Am. Chem. Soc. 2006, 128, 16510.
10. (b) Panneerselvam, A.; Malik, M. A.; Afzaal, M.; O'Brien, P.; Helliwell, M. J. Am. Chem. Soc. 2008, 130, 2420.
11. Fischer, R. A.; Parala, H. In Chemical Vapor Deposition: Precursors, Processes and Applications; Jones, A. C., Hitchman, M. L., Eds.; RSC: Cambridge, UK, 2009; Chapter 9.
12. (a) Milanov, A.; Bhakta, R.; Baunemann, A.; Becker, H.-W.; Thomas, R.; Ehrhart, P.; Winter, M.; Devi, A. Inorg. Chem. 2006, 45, 11008.
13. (b) Bekermann, D.; Barreca, D.; Devi, A.; Gasparotto, A.; Fischer, R. A. Electrochem. Soc. Trans. 2008, 16, 235.
14. (c) Baunemann, A.; Bekermann, D.; Thiede, T. B.; Parala, H.; Winter, M.; Gemel, C.; Fischer, R. A. Dalton Trans. 2008, 3715.
15. Milanov, A. P.; Fischer, R. A.; Devi, A. Inorg. Chem. 2008, 47, 11405.
16. Selected references: (a) Slifirski, J.; Huchet, G.; Reynes, A.; Marty, A.; Teyssandier, F. Chem. Mater. 1995, 7, 622.
17. (b) Bchir, O. J.; Johnston, S. W.; Cuadra, A. C.; Anderson, T. J.; Ortiz, C. G.; Brooks, B. C.; Powell, D. H.; McElwee-White, L. J. Cryst. Growth 2003, 249, 262.
18. (a) Ohno, H.; Chiba, D.; Matsukra, F.; Omiya, T.; Abe, E.; Dietl, T.; Ohno, Y.; Ohtani, K. Nature 2000, 408, 944.
19. (b) Lo, F.-Y.; Melnikov, A.; Reuter, D.; Cordier, Y.; Wieck, A. D. Appl. Phys. Lett. 2008, 92, 112111.
20. (c) Zhou, Y. K.; Choi, S. W.; Emura, S.; Hasegawa, S.; Asahi, H. Appl. Phys. Lett. 2008, 92, 062505.
21. Bilyy, R.; Podhorodecki, A.; Nyk, M.; Stoika, R.; Zaichenko, A.; Zatryb, G.; Misiewicz, J.; Strek, W. Physica E 2008, 40, 2096.