Evaluation of homoleptic guanidinate and amidinate complexes of gadolinium and dysprosium for MOCVD of rare-earth nitride thin films

Chemistry of Materials

Volumn 23, Issue 6, 2011, Pages 1430-1440

  Thiede, Tobias B ^a   Krasnopolski, Michael ^a   Milanov, Andrian P ^a   De Los Arcos, Teresa ^a   Ney, Andreas ^b   Becker, Hans Werner ^a   Rogalla, Detlef ^a   Winter, Joärg ^a   Devi, Anjana ^a   Fischer, Roland A ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

chemical vapor deposition; magnetic materials

Indexed keywords

AMIDINATES; ELECTRON IMPACT; FERROMAGNETIC GRAIN; FRAGMENTATION MECHANISM; FRAGMENTATION PATTERNS; GADOLINIUM NITRIDE; GUANIDINATES; HIGH RESOLUTION; HOMOLEPTIC; METALORGANIC CHEMICAL VAPOR DEPOSITION; MOCVD; MOCVD PRECURSORS; NITRIDE FILMS; NITRIDE THIN FILMS; NUCLEAR REACTION ANALYSIS; RUTHERFORD BACK-SCATTERING; SEM; SINGLE-SOURCE PRECURSOR; STRUCTURAL SIMILARITY; SUPERCONDUCTING QUANTUM INTERFERENCE DEVICE; TEMPERATURE DEPENDENT; THERMAL PROPERTIES;

AMMONIA; CARBON FILMS; COORDINATION REACTIONS; DEPOSITION; DYSPROSIUM; GADOLINIUM; MAGNETIC MATERIALS; MAGNETIC PROPERTIES; MASS SPECTROMETRY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NITRIDES; ORGANIC CHEMICALS; OXYGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SQUIDS; SUPERCONDUCTING FILMS; SUPERPARAMAGNETISM; THERMODYNAMIC PROPERTIES; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

RHENIUM COMPOUNDS;

EID: 79952748654     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm102840v     Document Type: Article

References (58)

1. Aerts, C. M.; Strange, P.; Horne, M.; Temmerman, W. M.; Szotek, Z.; Svane, A. Condensed Matter 2003, Preprint Archive.
2. Duan, C.-G.; Sabirianov, R. F.; Mei, W. N.; Dowben, P. A.; Jaswal, S. S.; Tsymball, E. Y. J. Phys.: Condens. Matter 2007, 315220
3. Khazen, K.; von Bardeleben, H. J.; Cantin, J. L.; Bittar, A.; Granville, S.; Trodahl, H. J.; Ruck, B. J. Phys. Rev. B 2006, 74, 245330
4. Leuenberger, F.; Parge, A.; Felsch, W.; Fauth, K.; Hessler, M. Phys. Rev. B 2005, 72, 014427
5. Zhou, Y. K.; Kim, M. S.; Teraguchi, N.; Suzuki, A.; Nanishi, Y.; Asahi, H. Phys. Status Solidi B 2003, 240 (2) 440
6. LaDuca, R. L.; Wolczanski, P. T. Inorg. Chem. 1992, 31 (8) 1311
7. Fitzmaurice, J. C.; Hector, A.; Rowley, A. T.; Parkin, I. P. Polyhedron 1994, 13 (2) 235
8. Scarpulla, M. A.; Gallinat, C. S.; Mack, S.; Speck, J. S.; Gossard, A. C. J. Cryst. Growth 2009, 311, 1239
9. Gerlach, J. W.; Menning, J.; Rauschenbach, B. Appl. Phys. Lett. 2007, 90, 061919
10. McKenzie, W. R.; Munroe, P. R.; Budde, F.; Ruck, B. J.; Granville, S.; Trodahl, H. J. Curr. Appl. Phys. 2006, 6, 407
11. Milanov, A. P.; Thiede, T. B.; Devi, A.; Fischer, R. A. J. Am. Chem. Soc. 2009, 131, 17062
12. Jones, A. C.; Hitchman, M. L. In Chemical Vapor Deposition: Precursors, Processes and Applications; Jones, A. C.; Hitchman, M. L., Eds.; RSC: Cambridge, U.K., 2009; Chapter 1.
13. Leskelaä, M.; Ritala, M. Angew. Chem., Int. Ed. 2003, 42, 5548
14. Knez, M.; Nielsch, K.; Niinistoä, L. Adv. Mater. 2007, 19, 3425
15. Selected references on SSPs: Shin, J.; Waheed, A.; Agapiou, K.; Winkenwerder, W. A.; Kim, H.-W.; Jones, R. A.; Hwang, G. S.; Ekerdt, J. G. J. Am. Chem. Soc. 2006, 128, 16510
16. Panneerselvam, A.; Malik, M. A.; Afzaal, M.; O'Brien, P.; Helliwell, M. J. Am. Chem. Soc. 2008, 130, 2420
17. Fischer, R. A.; Parala, H. In Chemical Vapor Deposition: Precursors, Processes and Applications; Jones, A. C.; Hitchman, M. L., Eds.; RSC: Cambridge, U.K., 2009; Chapter 9.
18. Fix, R. M.; Gordon, R. G.; Hoffman, D. M. Chem. Mater. 1993, 5, 614
19. McElwee-White, L. Dalton Trans. 2006, 5327
20. Potts, S. E.; Carmalt, C. J.; Blackman, C. S.; Leese, T.; Davies, H. O. Dalton Trans. 2008, 5730
21. Rische, D.; Baunemann, A.; Winter, M.; Fischer, R. A. Inorg. Chem. 2006, 45 (1) 269
22. Becker, J. S.; Suh, S.; Wang, S.; Gordon, R. Chem. Mater. 2003, 15, 2969
23. Rische, D.; Parala, H.; Gemel, E.; Winter, M.; Fischer, R. A. Chem. Mater. 2006, 18, 6075
24. Baunemann, A.; Lemberger, M.; Bauer, A. J.; Parala, H.; Fischer, R. A. Chem. Vap. Deposition 2007, 13 (2-3) 77
25. Thiede, T. B.; Parala, H.; Reuter, K.; Passing, G.; Kirchmeyer, S.; Hinz, J.; Lemberger, M.; Bauer, A. J.; Barreca, D.; Gasparotto, A.; Fischer, R. A. Chem. Vap. Deposition 2009, 15, 334
26. Rische, D.; Parala, H.; Baunemann, A.; Thiede, T.; Fischer, R. Surf. Coat. Technol. 2007, 201, 9125
27. Baunemann, A.; Bekermann, D.; Thiede, T. B.; Parala, H.; Winter, M.; Gemel, C.; Fischer, R. A. Dalton Trans. 2008, 3715
28. Milanov, A. P.; Fischer, R. A.; Devi, A. Inorg. Chem. 2008, 47, 11405
29. Slifirski, J.; Huchet, G.; Reynes, A.; Marty, A.; Teyssandier, F. Chem. Mater. 1995, 7, 622
30. Bchir, O. J.; Johnston, S. W.; Cuadra, A. C.; Anderson, T. J.; Ortiz, C. G.; Brooks, B. C.; Powell, D. H.; McElwee-White, L. J. Cryst. Growth 2003, 249, 262
31. de Rouffignac, P.; Gordon, R. G. Chem. Vap. Deposition 2006, 12, 152
32. Lim, B. S.; Rahtu, A.; de Rouffignac, P.; Gordon, R. G. Appl. Phys. Lett. 2004, 84, 3957
33. Lim, B. S.; Rahtu, A.; Park, J.-S.; Gordon, R. G. Inorg. Chem. 2003, 42, 7951
34. Kim, K. H.; Farmer, D. B.; Lehn, J.-S. M.; Rao, P. V.; Gordon, R. G. Appl. Phys. Lett. 2006, 89, 133512
35. Goel, S. C.; Kramer, K. S.; Chiang, M. Y.; Buhro, W. E. Polyhedron 1990, 4 (9) 6114113
36. Becker, R.; Devi, A.; Weiss, J.; Weckenmann, U.; Winter, M.; Kiener, C.; Becker, H.-W.; Fischer, R. A. Chem. Vap. Deposition 2003, 9 (3) 149
37. Elekes, Z.; Kiss, A. Z.; Biron, I.; Calligaro, T.; Salomon, J. Nucl. Instrum. Methods B 2000, 168, 305
38. Larson, P. E.; Kelly, M. A. J. Vac. Sci. Technol. A 1998, 16, 3483
39. Milanov, A. Thesis, Ruhr University, Bochum, Germany, 2010.
40. Kim, D.-H.; Wentorf, R. H., Jr.; Gill, W. N. J. Appl. Phys. 1993, 74, 5164
41. Nuesca, G. M.; Kelber, J. A. Thin Solid Films 1995, 262, 224
42. The International Centre for Diffraction Data PDF (Powder Diffraction File), JCPDS File Card No. 00-015-0888.
43. The International Centre for Diffraction Data PDF (Powder Diffraction File), JCPDS File Card No. 00-015-0884.
44. Ettmayer, P.; Waldhart, J.; Vendl, A.; Banik, G. Monatsh. Chem. 1980, 111, 945
45. Ettmayer, P.; Waldhart, J.; Vendl, A.; Banik, G. J. Nucl. Mater. 1980, 91, 293
46. Fitzmaurice, J. C.; Hector, A.; Rowley, A. T.; Parkin, I. P. Polyhedron 1994, 13 (2) 235
47. Gambino, R. J.; Cuomo, J. J. J. Electrochem. Soc. 1996, 113 (4) 401
48. Takano, M.; Itoh, A.; Akabori, M.; Ogawa, T. J. Alloys Compd. 2001, 327, 235
49. Wong, H. Y.; Ong, C. W.; Kwok, U. R. W. M.; Wong, K. W.; Wong, S. P.; Cheung, W. Y. Thin Solid Films 2000, 376, 131
50. Lademan, W. J.; See, A. K.; Klebanoff, L. E.; van der Laan, G. Phys. Rev. B 1996, 54 (23) 17191
51. Gupta, J. A.; Landheer, D.; Sproule, G. I.; McCaffrey, J. P.; Graham, M. J.; Yang, K.-C.; Lu, Z.-H.; Lennard, W. N. Appl. Surf. Sci. 2001, 173, 318
52. Moulder, J. F.; Stickle, W. F.; Sobol, P. E.; Bomben, K. D. Handbook of X-ray Photoelectron Spectroscopy: Physical Electronics: Minnesota, 1995.
53. Terzieff, P.; Lee, K. J. Appl. Phys. 1979, 50 (5) 3565
54. Sarma, D. D.; Rao, C. N. R. J. Electron Spectrosc. Relat. Phenom. 1980, 20, 25
55. Baltrusaitis, J.; Jayaweera, P. M.; Grassian, V. H. Phys. Chem. Chem. Phys. 2009, 11, 8295
56. Vasquez, R. P.; Foote, M. C.; Hunt, B. D. J. Appl. Phys. 1989, 66, 4867
57. Bassim, N.; Cracium, V.; Howard, J.; Singh, R. K. Appl. Surf. Sci. 2003, 205, 267
58. Leuenberger, F.; Parge, A.; Felsch, W.; Baudelet, F.; Giorgetti, C.; Dartyge, E.; Wilhelm, F. Phys. Rev. B 2006, 73, 214430