-
1
-
-
67650102619
-
-
10.1002/adma.200900375
-
R. Waser, R. Dittmann, G. Staikov, and K. Szot, Adv. Mater. 21, 2632-2663 (2009). 10.1002/adma.200900375
-
(2009)
Adv. Mater.
, vol.21
, pp. 2632-2663
-
-
Waser, R.1
Dittmann, R.2
Staikov, G.3
Szot, K.4
-
3
-
-
84861125089
-
-
10.1109/JPROC.2012.2190369
-
H. -S. P. Wong, H. Lee, S. Yu, Y.-S. Chen, Y. Wu, P.-S. Chen, B. Lee, F. T. Chen, and M.-J. Tsai, Proc. IEEE 100, 1951-1970 (2012). 10.1109/JPROC.2012. 2190369
-
(2012)
Proc. IEEE
, vol.100
, pp. 1951-1970
-
-
Wong, H.-S.P.1
Lee, H.2
Yu, S.3
Chen, Y.-S.4
Wu, Y.5
Chen, P.-S.6
Lee, B.7
Chen, F.T.8
Tsai, M.-J.9
-
4
-
-
84863020678
-
-
10.1109/IEDM.2011.6131652.
-
B. Govoreanu, G. S. Kar, Y. Chen, V. Paraschiv, S. Kubicek, A. Fantini, I. P. Radu, L. Goux, S. Clima, R. Degraeve, N. Jossart, O. Richard, T. Vandeweyer, K. Seo, P. Hendrickx, G. Pourtois, H. Bender, L. Altimime, D. J. Wouters, J. A. Kittl, and M. Jurczak, Tech. Dig.-Int. Electron Devices Meet. 2011, 729-732 10.1109/IEDM.2011.6131652.
-
(2011)
Tech. Dig. - Int. Electron Devices Meet.
, pp. 729-732
-
-
Govoreanu, B.1
Kar, G.S.2
Chen, Y.3
Paraschiv, V.4
Kubicek, S.5
Fantini, A.6
Radu, I.P.7
Goux, L.8
Clima, S.9
Degraeve, R.10
Jossart, N.11
Richard, O.12
Vandeweyer, T.13
Seo, K.14
Hendrickx, P.15
Pourtois, G.16
Bender, H.17
Altimime, L.18
Wouters, D.J.19
Kittl, J.A.20
Jurczak, M.21
more..
-
5
-
-
79951833149
-
-
10.1109/IEDM.2010.5703395.
-
H. Y. Lee, Y. S. Chen, P. S. Chen, P. Y. Gu, Y. Y. Hsu, S. M. Wang, W. H. Liu, C. H. Tsai, S. S. Sheu, P. C. Chiang, W. P. Lin, C. H. Lin, W. S. Chen, F. T. Chen, C. H. Lien, and M.-J. Tsai, Tech. Dig.-Int. Electron Devices Meet. 2010, 460-463 10.1109/IEDM.2010.5703395.
-
(2010)
Tech. Dig. - Int. Electron Devices Meet.
, pp. 460-463
-
-
Lee, H.Y.1
Chen, Y.S.2
Chen, P.S.3
Gu, P.Y.4
Hsu, Y.Y.5
Wang, S.M.6
Liu, W.H.7
Tsai, C.H.8
Sheu, S.S.9
Chiang, P.C.10
Lin, W.P.11
Lin, C.H.12
Chen, W.S.13
Chen, F.T.14
Lien, C.H.15
Tsai, M.-J.16
-
6
-
-
84860672719
-
-
10.1109/ISSCC.2012.6177079.
-
M.-F. Chang, C.-W. Wu, C.-C. Kuo, S.-J. Shen, K.-F. Lin, S.-M. Yang, Y.-C. King, C.-J. Lin, and Y.-D. Chih, Tech. Dig.-Int. Solid-State Circuits Conf. 2012, 434-435 10.1109/ISSCC.2012.6177079.
-
(2012)
Tech. Dig. - Int. Solid-State Circuits Conf.
, pp. 434-435
-
-
Chang, M.-F.1
Wu, C.-W.2
Kuo, C.-C.3
Shen, S.-J.4
Lin, K.-F.5
Yang, S.-M.6
King, Y.-C.7
Lin, C.-J.8
Chih, Y.-D.9
-
7
-
-
70549106464
-
-
10.1109/LED.2009.2032308
-
B. Gao, B. Sun, H. Zhang, L. Liu, X. Liu, R. Han, J. Kang, and B. Yu, IEEE Electron Device Lett. 30, 1326-1328 (2009). 10.1109/LED.2009.2032308
-
(2009)
IEEE Electron Device Lett.
, vol.30
, pp. 1326-1328
-
-
Gao, B.1
Sun, B.2
Zhang, H.3
Liu, L.4
Liu, X.5
Han, R.6
Kang, J.7
Yu, B.8
-
8
-
-
84859218369
-
-
10.1109/TED.2012.2184545
-
X. Guan, S. Yu, and H. -S. P. Wong, IEEE Trans. Electron Devices 59, 1172-1182, (2012). 10.1109/TED.2012.2184545
-
(2012)
IEEE Trans. Electron Devices
, vol.59
, pp. 1172-1182
-
-
Guan, X.1
Yu, S.2
Wong, H.-S.P.3
-
10
-
-
84879234076
-
-
10.1109/TNS.2013.2254497
-
S. Gerardin, M. Bagatin, A. Paccagnella, K. Grurmann, F. Gliem, T. R. Oldham, F. Irom, and D. N. Nguyen, IEEE Trans. Nucl. Sci. 60, 1953-1969 (2013). 10.1109/TNS.2013.2254497
-
(2013)
IEEE Trans. Nucl. Sci.
, vol.60
, pp. 1953-1969
-
-
Gerardin, S.1
Bagatin, M.2
Paccagnella, A.3
Grurmann, K.4
Gliem, F.5
Oldham, T.R.6
Irom, F.7
Nguyen, D.N.8
-
11
-
-
77953726701
-
-
10.1109/TNS.2010.2045768
-
W. M. Tong, J. J. Yang, P. J. Kuekes, D. R. Stewart, R. S. Williams, E. DeIonno, E. E. King, S. C. Witczak, M. D. Looper, and J. V. Osborn, IEEE Trans. Nucl. Sci. 57, 1640-1643 (2010). 10.1109/TNS.2010.2045768
-
(2010)
IEEE Trans. Nucl. Sci.
, vol.57
, pp. 1640-1643
-
-
Tong, W.M.1
Yang, J.J.2
Kuekes, P.J.3
Stewart, D.R.4
Williams, R.S.5
Deionno, E.6
King, E.E.7
Witczak, S.C.8
Looper, M.D.9
Osborn, J.V.10
-
12
-
-
83855163518
-
-
10.1109/TNS.2011.2168827
-
H. J. Barnaby, S. Malley, M. Land, S. Charnicki, A. Kathuria, B. Wilkens, E. DeIonno, and W. M. Tong, IEEE Trans. Nucl. Sci. 58, 2838-2844 (2011). 10.1109/TNS.2011.2168827
-
(2011)
IEEE Trans. Nucl. Sci.
, vol.58
, pp. 2838-2844
-
-
Barnaby, H.J.1
Malley, S.2
Land, M.3
Charnicki, S.4
Kathuria, A.5
Wilkens, B.6
Deionno, E.7
Tong, W.M.8
-
13
-
-
84876270195
-
-
10.1109/TNS.2013.2249529
-
E. DeIonno, M. D. Looper, J. V. Osborn, and J. W. Palko, IEEE Trans. Nucl. Sci. 60, 1379-1383 (2013). 10.1109/TNS.2013.2249529
-
(2013)
IEEE Trans. Nucl. Sci.
, vol.60
, pp. 1379-1383
-
-
Deionno, E.1
Looper, M.D.2
Osborn, J.V.3
Palko, J.W.4
-
14
-
-
84878706383
-
-
10.1109/AERO.2013.6497378.
-
E. DeIonno, M. D. Looper, J. V. Osborn, H. J. Barnaby, and W. M. Tong, IEEE Aerosp. Conf. 2013, 1-8 10.1109/AERO.2013.6497378.
-
(2013)
IEEE Aerosp. Conf.
, pp. 1-8
-
-
Deionno, E.1
Looper, M.D.2
Osborn, J.V.3
Barnaby, H.J.4
Tong, W.M.5
-
15
-
-
84872913996
-
-
10.1109/TNS.2012.2224377
-
M. J. Marinella, S. M. Dalton, P. R. Mickel, P. E. D. Dodd, M. R. Shaneyfelt, E. Bielejec, G. Vizkelethy, and P. G. Kotula, IEEE Trans. Nucl. Sci. 59, 2987-2994 (2012). 10.1109/TNS.2012.2224377
-
(2012)
IEEE Trans. Nucl. Sci.
, vol.59
, pp. 2987-2994
-
-
Marinella, M.J.1
Dalton, S.M.2
Mickel, P.R.3
Dodd, P.E.D.4
Shaneyfelt, M.R.5
Bielejec, E.6
Vizkelethy, G.7
Kotula, P.G.8
-
16
-
-
79960837285
-
-
10.1109/TED.2011.2148121
-
L. Zhang, R. Huang, D. Gao, P. Yue, P. Tang, F. Tan, Y. Cai, and Y. Y. Wang, IEEE Trans. Electron Devices 58, 2800-2804 (2011). 10.1109/TED.2011. 2148121
-
(2011)
IEEE Trans. Electron Devices
, vol.58
, pp. 2800-2804
-
-
Zhang, L.1
Huang, R.2
Gao, D.3
Yue, P.4
Tang, P.5
Tan, F.6
Cai, Y.7
Wang, Y.Y.8
-
17
-
-
84891559758
-
-
10.1109/TNS.2013.2287615.
-
F. Tan, R. Huang, X. An, Y. Cai, Y. Pan, W. Wu, H. Feng, X. Zhang, and Y. Y. Wang, IEEE Trans. Nucl. Sci. 60, 4520-4525 (2013) 10.1109/TNS.2013.2287615.
-
(2013)
IEEE Trans. Nucl. Sci.
, vol.60
, pp. 4520-4525
-
-
Tan, F.1
Huang, R.2
An, X.3
Cai, Y.4
Pan, Y.5
Wu, W.6
Feng, H.7
Zhang, X.8
Wang, Y.Y.9
-
19
-
-
84891557440
-
-
10.1109/TNS.2013.2289369
-
J. S. Bi, Z. S. Han, E. X. Zhang, M. W. McCurdy, R. A. Reed, R. D. Schrimpf, D. M. Fleetwood, M. L. Alles, R. A. Weller, D. Linten, M. Jurczak, and A. Fantini, IEEE Trans. Nucl. Sci. 60, 4540-4546 (2013). 10.1109/TNS.2013. 2289369
-
(2013)
IEEE Trans. Nucl. Sci.
, vol.60
, pp. 4540-4546
-
-
Bi, J.S.1
Han, Z.S.2
Zhang, E.X.3
McCurdy, M.W.4
Reed, R.A.5
Schrimpf, R.D.6
Fleetwood, D.M.7
Alles, M.L.8
Weller, R.A.9
Linten, D.10
Jurczak, M.11
Fantini, A.12
-
20
-
-
84891560843
-
-
10.1109/TNS.2013.2286318
-
Y. Gonzalez-Velo, H. J. Barnaby, M. N. Kozicki, P. Dandamudi, A. Chandran, K. E. Holbert, M. Mitkova, and M. Ailavajhala, IEEE Trans. Nucl. Sci. 60, 4563-4569 (2013). 10.1109/TNS.2013.2286318
-
(2013)
IEEE Trans. Nucl. Sci.
, vol.60
, pp. 4563-4569
-
-
Gonzalez-Velo, Y.1
Barnaby, H.J.2
Kozicki, M.N.3
Dandamudi, P.4
Chandran, A.5
Holbert, K.E.6
Mitkova, M.7
Ailavajhala, M.8
-
21
-
-
78650168122
-
-
10.1088/0957-4484/21/47/475206
-
B. Butcher, X. He, M. Huang, Y. Wang, Q. Liu, H. Lv, M. Liu, and W. Wang, Nanotechnology 21, 475206 (2010). 10.1088/0957-4484/21/47/475206
-
(2010)
Nanotechnology
, vol.21
, pp. 475206
-
-
Butcher, B.1
He, X.2
Huang, M.3
Wang, Y.4
Liu, Q.5
Lv, H.6
Liu, M.7
Wang, W.8
-
22
-
-
78649442260
-
-
10.1109/LED.2010.2081340
-
Y. Wang, H. Lv, W. Wang, Q. Liu, S. Long, Q. Wang, Z. Huo, S. Zhang, Y. Li, Q. Zuo, W. Lian, J. Yang, and M. Liu, IEEE Electron Device Lett. 31, 1470-1472 (2010). 10.1109/LED.2010.2081340
-
(2010)
IEEE Electron Device Lett.
, vol.31
, pp. 1470-1472
-
-
Wang, Y.1
Lv, H.2
Wang, W.3
Liu, Q.4
Long, S.5
Wang, Q.6
Huo, Z.7
Zhang, S.8
Li, Y.9
Zuo, Q.10
Lian, W.11
Yang, J.12
Liu, M.13
-
23
-
-
65249090190
-
-
10.1063/1.3093683
-
U. S. Joshi, S. J. Trivedi, K. H. Bhavsar, U. N. Trivedi, S. A. Khan, and D. K. Avasthi, J. Appl. Phys. 105, 073704 (2009). 10.1063/1.3093683
-
(2009)
J. Appl. Phys.
, vol.105
, pp. 073704
-
-
Joshi, U.S.1
Trivedi, S.J.2
Bhavsar, K.H.3
Trivedi, U.N.4
Khan, S.A.5
Avasthi, D.K.6
-
24
-
-
79959990092
-
-
10.1109/VTSA.2011.5872251.
-
S. Yu, Y. Wu, Y. Chai, J. Provine, and H. -S. P. Wong, Int. Symp. VLSI-TSA 2011, 106-107 10.1109/VTSA.2011.5872251.
-
(2011)
Int. Symp. VLSI-TSA
, pp. 106-107
-
-
Yu, S.1
Wu, Y.2
Chai, Y.3
Provine, J.4
Wong, H.-S.P.5
-
25
-
-
0034653621
-
-
10.1039/a908800h
-
J.-C. Dupin, D. Gonbeau, P. Vinatier, and A. Levasseur, Phys. Chem. Chem. Phys. 2, 1319-1324 (2000). 10.1039/a908800h
-
(2000)
Phys. Chem. Chem. Phys.
, vol.2
, pp. 1319-1324
-
-
Dupin, J.-C.1
Gonbeau, D.2
Vinatier, P.3
Levasseur, A.4
-
26
-
-
84874314756
-
-
10.1063/1.4791695
-
Y. S. Lin, F. Zeng, S. G. Tang, H. Y. Liu, C. Chen, S. Gao, Y. G. Wang, and F. Pan, J. Appl. Phys. 113, 064510 (2013). 10.1063/1.4791695
-
(2013)
J. Appl. Phys.
, vol.113
, pp. 064510
-
-
Lin, Y.S.1
Zeng, F.2
Tang, S.G.3
Liu, H.Y.4
Chen, C.5
Gao, S.6
Wang, Y.G.7
Pan, F.8
|