Progress in the development and understanding of advanced low k and ultralow k dielectrics for very large-scale integrated interconnects - State of the art

Applied Physics Reviews

Volumn 1, Issue 1, 2014, Pages

  Grill, Alfred ^a   Gates, Stephen M ^a   Ryan, Todd E ^b   Nguyen, Son V ^c   Priyadarshini, Deepika ^c  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b IBM MICROELECTRONICS   (United States)

^c IBM RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; DIELECTRIC MATERIALS; MICROPROCESSOR CHIPS;

DEVICE GENERATION; DIELECTRIC INSULATORS; HIGH PERFORMANCE DEVICES; INTEGRATION PROCESSING; INTERCONNECT DIELECTRICS; LOW DIELECTRIC CONSTANTS; RESISTANCE CAPACITANCE; ULTRA-LOW-K DIELECTRICS;

INTEGRATED CIRCUIT INTERCONNECTS;

EID: 84898976158     PISSN: None     EISSN: 19319401     Source Type: Journal    
DOI: 10.1063/1.4861876     Document Type: Review

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