Oxygen radical and plasma damage of low- k organosilicate glass materials: Diffusion-controlled mechanism for carbon depletion

Journal of Applied Physics

Volumn 106, Issue 1, 2009, Pages

  Goldman, M A ^a   Graves, D B ^a   Antonelli, G A ^b   Behera, S P ^c   Kelber, J A ^c  

^a University of California   (United States)

^b Novellus Systems   (United States)

^c UNIVERSITY OF NORTH TEXAS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORBANCE; CAPACITIVELY COUPLED; CARBON DEPLETION; CARBON LOSS; EXPOSURE-TIME; FOURIER TRANSFORM INFRARED; FTIR MEASUREMENTS; HIGH POROSITY; INITIAL RATE; INTERCONNECTED PORES; LINEAR DEPENDENCE; LIQUID DIFFUSION; LOW-K MATERIALS; NOBLE GAS; NOBLE GAS IONS; O RADICALS; ORGANOSILICATE GLASS; OXYGEN PLASMA EXPOSURE; OXYGEN RADICAL; PLASMA DAMAGE; PRE-TREATMENT; REACTION FRONT; SILANOL; SQUARE ROOTS; SURFACE PORES;

DIFFUSION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLASS; INERT GASES; ION BOMBARDMENT; IONS; OXYGEN; PLASMAS; POROSITY;

MATERIALS;

EID: 67650718163     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3168428     Document Type: Article

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